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Title: Uniform Vapor-Pressure-Based Chemical Vapor Deposition Growth of MoS 2 Using MoO 3 Thin Film as a Precursor for Coevaporation
Award ID(s):
1728309
PAR ID:
10082429
Author(s) / Creator(s):
 ;  ;  ;  ;  ;  
Publisher / Repository:
American Chemical Society
Date Published:
Journal Name:
ACS Omega
Volume:
3
Issue:
12
ISSN:
2470-1343
Page Range / eLocation ID:
p. 18943-18949
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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