Bae, Sang-Hoon, Lu, Kuangye, Han, Yimo, Kim, Sungkyu, Qiao, Kuan, Choi, Chanyeol, Nie, Yifan, Kim, Hyunseok, Kum, Hyun S., Chen, Peng, Kong, Wei, Kang, Beom-Seok, Kim, Chansoo, Lee, Jaeyong, Baek, Yongmin, Shim, Jaewoo, Park, Jinhee, Joo, Minho, Muller, David A., Lee, Kyusang, and Kim, Jeehwan.
"Graphene-assisted spontaneous relaxation towards dislocation-free heteroepitaxy". Nature Nanotechnology 15 (4). Country unknown/Code not available. https://doi.org/10.1038/s41565-020-0633-5.https://par.nsf.gov/biblio/10146242.
@article{osti_10146242,
place = {Country unknown/Code not available},
title = {Graphene-assisted spontaneous relaxation towards dislocation-free heteroepitaxy},
url = {https://par.nsf.gov/biblio/10146242},
DOI = {10.1038/s41565-020-0633-5},
abstractNote = {},
journal = {Nature Nanotechnology},
volume = {15},
number = {4},
author = {Bae, Sang-Hoon and Lu, Kuangye and Han, Yimo and Kim, Sungkyu and Qiao, Kuan and Choi, Chanyeol and Nie, Yifan and Kim, Hyunseok and Kum, Hyun S. and Chen, Peng and Kong, Wei and Kang, Beom-Seok and Kim, Chansoo and Lee, Jaeyong and Baek, Yongmin and Shim, Jaewoo and Park, Jinhee and Joo, Minho and Muller, David A. and Lee, Kyusang and Kim, Jeehwan},
}
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