Jiang, Jing, Jung, Byungki, Thompson, Michael O., and Ober, Christopher K. Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications. Retrieved from https://par.nsf.gov/biblio/10147661. Journal of Vacuum Science & Technology B 37.4 Web. doi:10.1116/1.5086871.

Jiang, Jing, Jung, Byungki, Thompson, Michael O., & Ober, Christopher K. Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications. Journal of Vacuum Science & Technology B, 37 (4). Retrieved from https://par.nsf.gov/biblio/10147661. https://doi.org/10.1116/1.5086871

Jiang, Jing, Jung, Byungki, Thompson, Michael O., and Ober, Christopher K. "Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications". Journal of Vacuum Science & Technology B 37 (4). Country unknown/Code not available. https://doi.org/10.1116/1.5086871. https://par.nsf.gov/biblio/10147661.

@article{osti_10147661,
place = {Country unknown/Code not available}, title = {Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications}, url = {https://par.nsf.gov/biblio/10147661}, DOI = {10.1116/1.5086871}, abstractNote = {}, journal = {Journal of Vacuum Science & Technology B}, volume = {37}, number = {4}, author = {Jiang, Jing and Jung, Byungki and Thompson, Michael O. and Ober, Christopher K.}, }