Kim, Jun Hyuk, Chern, Zhao-Ying, Yoo, Seonyoung, deGlee, Ben, Wang, Jenghan, and Liu, Meilin. Unraveling the Mechanism of Water-Mediated Sulfur Tolerance via Operando Surface-Enhanced Raman Spectroscopy. Retrieved from https://par.nsf.gov/biblio/10147763. ACS Applied Materials & Interfaces 12.2 Web. doi:10.1021/acsami.9b17294.

Kim, Jun Hyuk, Chern, Zhao-Ying, Yoo, Seonyoung, deGlee, Ben, Wang, Jenghan, & Liu, Meilin. Unraveling the Mechanism of Water-Mediated Sulfur Tolerance via Operando Surface-Enhanced Raman Spectroscopy. ACS Applied Materials & Interfaces, 12 (2). Retrieved from https://par.nsf.gov/biblio/10147763. https://doi.org/10.1021/acsami.9b17294

Kim, Jun Hyuk, Chern, Zhao-Ying, Yoo, Seonyoung, deGlee, Ben, Wang, Jenghan, and Liu, Meilin. "Unraveling the Mechanism of Water-Mediated Sulfur Tolerance via Operando Surface-Enhanced Raman Spectroscopy". ACS Applied Materials & Interfaces 12 (2). Country unknown/Code not available. https://doi.org/10.1021/acsami.9b17294. https://par.nsf.gov/biblio/10147763.

@article{osti_10147763,
place = {Country unknown/Code not available}, title = {Unraveling the Mechanism of Water-Mediated Sulfur Tolerance via Operando Surface-Enhanced Raman Spectroscopy}, url = {https://par.nsf.gov/biblio/10147763}, DOI = {10.1021/acsami.9b17294}, abstractNote = {}, journal = {ACS Applied Materials & Interfaces}, volume = {12}, number = {2}, author = {Kim, Jun Hyuk and Chern, Zhao-Ying and Yoo, Seonyoung and deGlee, Ben and Wang, Jenghan and Liu, Meilin}, }