There are a range of fundamental challenges associated with scaling optoelectronic devices down to the nano-scale, and the past decades have seen significant research dedicated to the development of sub-diffraction-limit optical devices, often relying on the plasmonic response of metal structures. At the longer wavelengths associated with the mid-infrared, dramatic changes in the optical response of traditional nanophotonic materials, reduced efficiency optoelectronic active regions, and a host of deleterious and/or parasitic effects makes nano-scale optoelectronics at micro-scale wavelengths particularly challenging. In this Perspective, we describe recent work leveraging a class of infrared plasmonic materials, highly doped semiconductors, which not only support sub-diffraction-limit plasmonic modes at long wavelengths, but which can also be integrated into a range of optoelectronic device architectures. We discuss how the wavelength-dependent optical response of these materials can serve a number of different photonic device designs, including dielectric waveguides, epsilon-near-zero dynamic optical devices, cavity-based optoelectronics, and plasmonic device architectures. We present recent results demonstrating that the highly doped semiconductor class of materials offers the opportunity for monolithic, all-epitaxial, device architectures out-performing current state of the art commercial devices, and discuss the perspectives and promise of these materials for infrared nanophotonic optoelectronics.
This paper describes a tape nanolithography method for the rapid and economical manufacturing of flexible, wearable nanophotonic devices. This method involves the soft lithography of a donor substrate with air-void nanopatterns, subsequent deposition of materials onto the substrate surface, followed by direct taping and peeling of the deposited materials by an adhesive tape. Without using any sophisticated techniques, the nanopatterns, which are preformed on the surface of the donor substrate, automatically emerge in the deposited materials. The nanopatterns can then be transferred to the tape surface. By leveraging the works of adhesion at the interfaces of the donor substrate-deposited material-tape assembly, this method not only demonstrates sub-hundred-nanometer resolution in the transferred nanopatterns on an area of multiple square inches but also exhibits high versatility and flexibility for configuring the shapes, dimensions, and material compositions of tape-supported nanopatterns to tune their optical properties. After the tape transfer, the materials that remain at the bottom of the air-void nanopatterns on the donor substrate exhibit shapes complementary to the transferred nanopatterns on the tape surface but maintain the same composition, thus also acting as functional nanophotonic structures. Using tape nanolithography, we demonstrate several tape-supported plasmonic, dielectric, and metallo-dielectric nanostructures, as well as several devices such as refractive index sensors, conformable plasmonic surfaces, and Fabry-Perot cavity resonators. Further, we demonstrate tape nanolithography-assisted manufacturing of a standalone plasmonic nanohole film and its transfer to unconventional substrates such as a cleaved facet and the curved side of an optical fiber.
more » « less- Award ID(s):
- 1711839
- NSF-PAR ID:
- 10154377
- Publisher / Repository:
- Nature Publishing Group
- Date Published:
- Journal Name:
- Microsystems & Nanoengineering
- Volume:
- 4
- Issue:
- 1
- ISSN:
- 2055-7434
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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