Tjiptowidjojo, Kristianto, Han, Seok Jun, Han, Sang Eon, Han, Sang M., and Schunk, P. Randall. Mass Transfer Limited KOH Etching in Crystalline Silicon using a Confinement Mask. Retrieved from https://par.nsf.gov/biblio/10167617. ECS Journal of Solid State Science and Technology 9.3 Web. doi:10.1149/2162-8777/ab8063.

Tjiptowidjojo, Kristianto, Han, Seok Jun, Han, Sang Eon, Han, Sang M., & Schunk, P. Randall. Mass Transfer Limited KOH Etching in Crystalline Silicon using a Confinement Mask. ECS Journal of Solid State Science and Technology, 9 (3). Retrieved from https://par.nsf.gov/biblio/10167617. https://doi.org/10.1149/2162-8777/ab8063

Tjiptowidjojo, Kristianto, Han, Seok Jun, Han, Sang Eon, Han, Sang M., and Schunk, P. Randall. "Mass Transfer Limited KOH Etching in Crystalline Silicon using a Confinement Mask". ECS Journal of Solid State Science and Technology 9 (3). Country unknown/Code not available. https://doi.org/10.1149/2162-8777/ab8063. https://par.nsf.gov/biblio/10167617.

@article{osti_10167617,
place = {Country unknown/Code not available}, title = {Mass Transfer Limited KOH Etching in Crystalline Silicon using a Confinement Mask}, url = {https://par.nsf.gov/biblio/10167617}, DOI = {10.1149/2162-8777/ab8063}, abstractNote = {}, journal = {ECS Journal of Solid State Science and Technology}, volume = {9}, number = {3}, author = {Tjiptowidjojo, Kristianto and Han, Seok Jun and Han, Sang Eon and Han, Sang M. and Schunk, P. Randall}, }