Han, Changho, Kahng, Andrew B., Wang, Lutong, and Xu, Bangqi. Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI. Retrieved from https://par.nsf.gov/biblio/10171000. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 38.9 Web. doi:10.1109/TCAD.2018.2859266.

Han, Changho, Kahng, Andrew B., Wang, Lutong, & Xu, Bangqi. Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 38 (9). Retrieved from https://par.nsf.gov/biblio/10171000. https://doi.org/10.1109/TCAD.2018.2859266

Han, Changho, Kahng, Andrew B., Wang, Lutong, and Xu, Bangqi. "Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI". IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 38 (9). Country unknown/Code not available. https://doi.org/10.1109/TCAD.2018.2859266. https://par.nsf.gov/biblio/10171000.

@article{osti_10171000,
place = {Country unknown/Code not available}, title = {Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI}, url = {https://par.nsf.gov/biblio/10171000}, DOI = {10.1109/TCAD.2018.2859266}, abstractNote = {}, journal = {IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems}, volume = {38}, number = {9}, author = {Han, Changho and Kahng, Andrew B. and Wang, Lutong and Xu, Bangqi}, }