Terkowski, Lukas, Martin, Iain W., Axmann, Daniel, Behrendsen, Malte, Pein, Felix, Bell, Angus, Schnabel, Roman, Bassiri, Riccardo, Fejer, Martin M., Hough, Jim, Markosyan, Ashot, Rowan, Sheila, and Steinlechner, Jessica.
"Influence of deposition parameters on the optical absorption of amorphous silicon thin films". Physical Review Research 2 (3). Country unknown/Code not available. https://doi.org/10.1103/PhysRevResearch.2.033308.https://par.nsf.gov/biblio/10203141.
@article{osti_10203141,
place = {Country unknown/Code not available},
title = {Influence of deposition parameters on the optical absorption of amorphous silicon thin films},
url = {https://par.nsf.gov/biblio/10203141},
DOI = {10.1103/PhysRevResearch.2.033308},
abstractNote = {},
journal = {Physical Review Research},
volume = {2},
number = {3},
author = {Terkowski, Lukas and Martin, Iain W. and Axmann, Daniel and Behrendsen, Malte and Pein, Felix and Bell, Angus and Schnabel, Roman and Bassiri, Riccardo and Fejer, Martin M. and Hough, Jim and Markosyan, Ashot and Rowan, Sheila and Steinlechner, Jessica},
editor = {null}
}
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