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Title: Two-dimensional extreme skin depth engineering for CMOS photonics

Extreme skin depth engineering (e-skid) can be applied to integrated photonics to manipulate the evanescent field of a waveguide. Here we demonstrate thate-skidcan be implemented in two directions in order to deterministically engineer the evanescent wave allowing for dense integration with enhanced functionalities. In particular, by increasing the skin depth, we enable the creation of two-dimensional (2D)e-skiddirectional couplers with large gaps and operational bandwidth. Here we experimentally validate 2De-skidfor integrated photonics in a complementary metal–oxide semiconductor (CMOS) photonics foundry and demonstrate strong coupling with a gap of 1.44 µm.

 
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Award ID(s):
1810282
NSF-PAR ID:
10218635
Author(s) / Creator(s):
; ; ; ; ; ; ; ; ; ; ;
Publisher / Repository:
Optical Society of America
Date Published:
Journal Name:
Journal of the Optical Society of America B
Volume:
38
Issue:
4
ISSN:
0740-3224; JOBPDE
Format(s):
Medium: X Size: Article No. 1307
Size(s):
["Article No. 1307"]
Sponsoring Org:
National Science Foundation
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