Rao, M.G. Syamala, Meza-Arroyo, J., Reddy, K. Chandra, Murthy, Lakshmi N.S., de Urquijo-Ventura, M.S., Garibay-Martínez, F., Hsu, Julia W.P, and Ramirez-Bon, R. Tuning the electrical performance of solution-processed In2O3TFTs by low-temperature with HfO2-PVP hybrid dielectric. Retrieved from https://par.nsf.gov/biblio/10272381. Materials Today Communications 26.C Web. doi:10.1016/j.mtcomm.2021.102120.

Rao, M.G. Syamala, Meza-Arroyo, J., Reddy, K. Chandra, Murthy, Lakshmi N.S., de Urquijo-Ventura, M.S., Garibay-Martínez, F., Hsu, Julia W.P, & Ramirez-Bon, R. Tuning the electrical performance of solution-processed In2O3TFTs by low-temperature with HfO2-PVP hybrid dielectric. Materials Today Communications, 26 (C). Retrieved from https://par.nsf.gov/biblio/10272381. https://doi.org/10.1016/j.mtcomm.2021.102120

Rao, M.G. Syamala, Meza-Arroyo, J., Reddy, K. Chandra, Murthy, Lakshmi N.S., de Urquijo-Ventura, M.S., Garibay-Martínez, F., Hsu, Julia W.P, and Ramirez-Bon, R. "Tuning the electrical performance of solution-processed In2O3TFTs by low-temperature with HfO2-PVP hybrid dielectric". Materials Today Communications 26 (C). Country unknown/Code not available. https://doi.org/10.1016/j.mtcomm.2021.102120. https://par.nsf.gov/biblio/10272381.

@article{osti_10272381,
place = {Country unknown/Code not available}, title = {Tuning the electrical performance of solution-processed In2O3TFTs by low-temperature with HfO2-PVP hybrid dielectric}, url = {https://par.nsf.gov/biblio/10272381}, DOI = {10.1016/j.mtcomm.2021.102120}, abstractNote = {}, journal = {Materials Today Communications}, volume = {26}, number = {C}, author = {Rao, M.G. Syamala and Meza-Arroyo, J. and Reddy, K. Chandra and Murthy, Lakshmi N.S. and de Urquijo-Ventura, M.S. and Garibay-Martínez, F. and Hsu, Julia W.P and Ramirez-Bon, R.}, editor = {null} }