Watkins, Luisa, Seidel, Sheila, Peng, Minxu, Agarwal, Akshay, Yu, Christopher, and Goyal, Vivek. Prevention Beats Removal: Avoiding Stripe Artifacts from Current Variation in Particle Beam Microscopy Through Time-Resolved Sensing. Retrieved from https://par.nsf.gov/biblio/10286008. Microscopy and Microanalysis 27.S1 Web. doi:10.1017/S1431927621002026.

Watkins, Luisa, Seidel, Sheila, Peng, Minxu, Agarwal, Akshay, Yu, Christopher, & Goyal, Vivek. Prevention Beats Removal: Avoiding Stripe Artifacts from Current Variation in Particle Beam Microscopy Through Time-Resolved Sensing. Microscopy and Microanalysis, 27 (S1). Retrieved from https://par.nsf.gov/biblio/10286008. https://doi.org/10.1017/S1431927621002026

Watkins, Luisa, Seidel, Sheila, Peng, Minxu, Agarwal, Akshay, Yu, Christopher, and Goyal, Vivek. "Prevention Beats Removal: Avoiding Stripe Artifacts from Current Variation in Particle Beam Microscopy Through Time-Resolved Sensing". Microscopy and Microanalysis 27 (S1). Country unknown/Code not available. https://doi.org/10.1017/S1431927621002026. https://par.nsf.gov/biblio/10286008.

@article{osti_10286008,
place = {Country unknown/Code not available}, title = {Prevention Beats Removal: Avoiding Stripe Artifacts from Current Variation in Particle Beam Microscopy Through Time-Resolved Sensing}, url = {https://par.nsf.gov/biblio/10286008}, DOI = {10.1017/S1431927621002026}, abstractNote = {}, journal = {Microscopy and Microanalysis}, volume = {27}, number = {S1}, author = {Watkins, Luisa and Seidel, Sheila and Peng, Minxu and Agarwal, Akshay and Yu, Christopher and Goyal, Vivek}, editor = {null} }