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Azizimanesh, Ahmad, Peña, Tara, Sewaket, Arfan, Hou, Wenhui, and Wu, Stephen M. Uniaxial and biaxial strain engineering in 2D MoS 2 with lithographically patterned thin film stressors. Retrieved from https://par.nsf.gov/biblio/10289829. Applied Physics Letters 118.21 Web. doi:10.1063/5.0049446.
Azizimanesh, Ahmad, Peña, Tara, Sewaket, Arfan, Hou, Wenhui, & Wu, Stephen M. Uniaxial and biaxial strain engineering in 2D MoS 2 with lithographically patterned thin film stressors. Applied Physics Letters, 118 (21). Retrieved from https://par.nsf.gov/biblio/10289829. https://doi.org/10.1063/5.0049446
Azizimanesh, Ahmad, Peña, Tara, Sewaket, Arfan, Hou, Wenhui, and Wu, Stephen M.
"Uniaxial and biaxial strain engineering in 2D MoS 2 with lithographically patterned thin film stressors". Applied Physics Letters 118 (21). Country unknown/Code not available. https://doi.org/10.1063/5.0049446.https://par.nsf.gov/biblio/10289829.
@article{osti_10289829,
place = {Country unknown/Code not available},
title = {Uniaxial and biaxial strain engineering in 2D MoS 2 with lithographically patterned thin film stressors},
url = {https://par.nsf.gov/biblio/10289829},
DOI = {10.1063/5.0049446},
abstractNote = {},
journal = {Applied Physics Letters},
volume = {118},
number = {21},
author = {Azizimanesh, Ahmad and Peña, Tara and Sewaket, Arfan and Hou, Wenhui and Wu, Stephen M.},
editor = {null}
}
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