Patternable Mesoporous Thin Film Quantum Materials via Block Copolymer Self-Assembly: An Emergent Technology?
- Award ID(s):
- 1719875
- PAR ID:
- 10325711
- Date Published:
- Journal Name:
- ACS Applied Materials & Interfaces
- Volume:
- 13
- Issue:
- 29
- ISSN:
- 1944-8244
- Page Range / eLocation ID:
- 34732 to 34741
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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