Yang, Yuhang, Kelkar, Varun A., Rajput, Hemangg S., Salazar Coariti, Adriana C., Toussaint, Kimani C., and Shao, Chenhui. Machine-learning-enabled geometric compliance improvement in two-photon lithography without hardware modifications. Retrieved from https://par.nsf.gov/biblio/10326305. Journal of Manufacturing Processes 76.C Web. doi:10.1016/j.jmapro.2022.02.046.

Yang, Yuhang, Kelkar, Varun A., Rajput, Hemangg S., Salazar Coariti, Adriana C., Toussaint, Kimani C., & Shao, Chenhui. Machine-learning-enabled geometric compliance improvement in two-photon lithography without hardware modifications. Journal of Manufacturing Processes, 76 (C). Retrieved from https://par.nsf.gov/biblio/10326305. https://doi.org/10.1016/j.jmapro.2022.02.046

Yang, Yuhang, Kelkar, Varun A., Rajput, Hemangg S., Salazar Coariti, Adriana C., Toussaint, Kimani C., and Shao, Chenhui. "Machine-learning-enabled geometric compliance improvement in two-photon lithography without hardware modifications". Journal of Manufacturing Processes 76 (C). Country unknown/Code not available. https://doi.org/10.1016/j.jmapro.2022.02.046. https://par.nsf.gov/biblio/10326305.

@article{osti_10326305,
place = {Country unknown/Code not available}, title = {Machine-learning-enabled geometric compliance improvement in two-photon lithography without hardware modifications}, url = {https://par.nsf.gov/biblio/10326305}, DOI = {10.1016/j.jmapro.2022.02.046}, abstractNote = {}, journal = {Journal of Manufacturing Processes}, volume = {76}, number = {C}, author = {Yang, Yuhang and Kelkar, Varun A. and Rajput, Hemangg S. and Salazar Coariti, Adriana C. and Toussaint, Kimani C. and Shao, Chenhui}, }