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  • Re-examination of the Aqueous Stability of Atomic Layer Deposited (ALD) Amorphous Alumina (Al 2 O 3 ) Thin Films and the Use of a Postdeposition Air Plasma Anneal to Enhance Stability
Title: Re-examination of the Aqueous Stability of Atomic Layer Deposited (ALD) Amorphous Alumina (Al 2 O 3 ) Thin Films and the Use of a Postdeposition Air Plasma Anneal to Enhance Stability
Award ID(s):
1954809
PAR ID:
10328099
Author(s) / Creator(s):
; ; ;
Date Published:
Journal Name:
Langmuir
Volume:
37
Issue:
49
ISSN:
0743-7463
Page Range / eLocation ID:
14509 to 14519
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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