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  • Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates
Title: Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates
Award ID(s):
1720633 1914769 1825938
PAR ID:
10330204
Author(s) / Creator(s):
; ; ;
Date Published:
Journal Name:
Journal of Vacuum Science & Technology A
Volume:
40
Issue:
2
ISSN:
0734-2101
Page Range / eLocation ID:
023403
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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