Hybrid graphene (Gr)–quantum dot (QD) photodetectors have shown ultrahigh photoresponsivity combining the strong light absorption of QDs with the high mobility of Gr. QDs absorb light and generate photocarriers that are efficiently transported by Gr. Typically, hybrid PbS–QD/graphene photodetectors operate by transferring photogenerated holes from the QDs to Gr while photoelectrons stay in the QDs inducing a photogating mechanism that achieves a responsivity of 6 × 107A W−1. However, despite such high gain, these systems have poor charge collection with quantum efficiency below 25%. Herein, a ZnO intermediate layer (PbS‐QD/ZnO/Gr) is introduced to improve charge collection by forming an effective p‐n PbS‐ZnO junction driving the electrons to the ZnO layer and then to Gr. This improves the photoresponsivity of the devices by nearly an order of magnitude with respect to devices without ZnO. Charge transfer to Gr is demonstrated by monitoring the change in Fermi level under illumination for conventional PbS‐QD/Gr and for ZnO intermediate PbS‐QD/ZnO/Gr devices. These results improve the capabilities of hybrid QD/Gr configurations for optoelectronic devices.
High resolution patterning of PbS quantum dots/graphene photodetectors with high responsivity via photolithography with a top graphene layer to protect surface ligands
Photodetectors based on colloidal quantum dots (CQDs) and single layer graphene (SLG) have shown high responsivity due to the synergy of strong light absorption from CQDs and high mobility from SLG. However, it is still challenging to achieve high-density and small-footprint devices on a chip to meet the demand for their integration into electronic devices. Even though there are numerous approaches to pattern the chemically fragile CQD films, usually they require non-conventional approaches such as stamping and surface modification that may be non-compatible with semiconductor processing. In this study, we show that conventional lithography and dry etching can be used to pattern QD active films by employing a graphene monolayer passivation/protective layer that protects the surface ligands of CQDs. This protective layer avoids damage induced by lithography process solvents that deteriorate the carrier mobility of CQDs and therefore the photoresponse. Herein we report patterning of CQDs using conventional UV photolithography, achieving reproducible five-micron length PbS CQDs/SLG photodetectors with a responsivity of 10 8 A W −1 . We have also fabricated thirty-six PbS CQDs/SLG photodetectors on a single chip to establish micron size photodetectors. This process offers an approach to pattern QDs with conventional UV lithography and dry etching semiconductor technology to facilitate their integration into current semiconductor commercial technology.
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- Award ID(s):
- 2046176
- NSF-PAR ID:
- 10335076
- Date Published:
- Journal Name:
- Nanoscale Advances
- Volume:
- 3
- Issue:
- 21
- ISSN:
- 2516-0230
- Page Range / eLocation ID:
- 6206 to 6212
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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- Free Publicly Accessible Full Text
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Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.1039/d1na00582k
