Metalorganic chemical vapor deposition (MOCVD) growths of β-Ga 2 O 3 on on-axis (100) Ga 2 O 3 substrates are comprehensively investigated. Key MOCVD growth parameters including growth temperature, pressure, group VI/III molar flow rate ratio, and carrier gas flow rate are mapped. The dependence of the growth conditions is correlated with surface morphology, growth rate, and electron transport properties of the MOCVD grown (100) β-Ga 2 O 3 thin films. Lower shroud gas (argon) flow is found to enhance the surface smoothness with higher room temperature (RT) electron Hall mobility. The growth rate of the films decreases but with an increase of electron mobility as the VI/III molar flow rate ratio increases. Although no significant variation on the surface morphologies is observed at different growth temperatures, the general trend of electron Hall mobilities are found to increase with increasing growth temperature. The growth rates reduce significantly with uniform surface morphologies as the chamber pressure increases. By tuning the silane flow rate, the controllable carrier concentration of (100) β-Ga 2 O 3 thin films between low-10 17 cm −3 and low-10 18 cm −3 was achieved. Under optimized growth condition, an (100) β-Ga 2 O 3 thin film with RMS roughness value of 1.64 nm and a RT mobility of 24 cm 2 /Vs at a carrier concentration of 7.0 × 10 17 cm −3 are demonstrated. The mobilities are primarily limited by the twin lamellae and stacking faults defects generated from the growth interface. Atomic resolution scanning transmission electron microscopy reveals the formation of twin boundary defects in the films, resulting in the degradation of crystalline quality. Results from this work provide fundamental understanding of the MOCVD epitaxy of (100) β-Ga 2 O 3 on on-axis Ga 2 O 3 substrates and the dependence of the material properties on growth conditions. The limitation of electron transport properties of the (100) β-Ga 2 O 3 thin films below 25 cm 2 /Vs is attributed to the formation of incoherent boundaries (twin lamellae) and stacking faults grown along the on-axis (100) crystal orientation.
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(Digital Presentation) Calculation of the Energy Band Diagram and Estimation of Electronic Transport Parameters of Metastable Amorphous Ge 2 Sb 2 Te 5
We calculate critical electronic conduction parameters of the amorphous phase of Ge 2 Sb 2 Te 5 (GST), a common material used in phase change memory. We estimate the room temperature bandgap of metastable amorphous GST to be E g (300K) = 1.84 eV based on a temperature dependent energy band model. We estimate the free carrier concentration at the melting temperature utilizing the latent heat of fusion to be 1.47 x 10 22 cm -3 . Using the thin film melt resistivity, we calculate the carrier mobility at melting point as 0.187 cm 2 /V-s. Assuming that metastable amorphous GST is a supercooled liquid with bipolar conduction, we compute the total carrier concentration as a function of temperature and estimate the room temperature free carrier concentration as p(300K) ≈ n(300K) = 1.69×10 17 cm -3 . Free electrons and holes are expected to recombine over time and the stable (drifted) amorphous GST is estimated to have p-type conduction with p(300K) ≈ 6×10 16 cm -3 .
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- PAR ID:
- 10342035
- Date Published:
- Journal Name:
- ECS Transactions
- Volume:
- 108
- Issue:
- 1
- ISSN:
- 1938-5862
- Page Range / eLocation ID:
- 29 to 36
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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