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  • Nanoscale Ruthenium-Containing Deposits from Ru(CO) 4 I 2 via Simultaneous Focused Electron Beam-Induced Deposition and Etching in Ultrahigh Vacuum: Mask Repair in Extreme Ultraviolet Lithography and Beyond
Title: Nanoscale Ruthenium-Containing Deposits from Ru(CO) 4 I 2 via Simultaneous Focused Electron Beam-Induced Deposition and Etching in Ultrahigh Vacuum: Mask Repair in Extreme Ultraviolet Lithography and Beyond
Award ID(s):
1904802
PAR ID:
10352300
Author(s) / Creator(s):
; ; ; ; ;
Date Published:
Journal Name:
ACS Applied Nano Materials
Volume:
5
Issue:
3
ISSN:
2574-0970
Page Range / eLocation ID:
3855 to 3865
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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