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Epitaxial ScxAl1−xN thin films of ∼100 nm thickness grown on metal polar GaN substrates are found to exhibit significantly enhanced relative dielectric permittivity (εr) values relative to AlN. εrvalues of ∼17–21 for Sc mole fractions of 17%–25% ( x = 0.17–0.25) measured electrically by capacitance–voltage measurements indicate that ScxAl1−xN has the largest relative dielectric permittivity of any existing nitride material. Since epitaxial ScxAl1−xN layers deposited on GaN also exhibit large polarization discontinuity, the heterojunction can exploit the in situ high-K dielectric property to extend transistor operation for power electronics and high-speed microwave applications.
- Award ID(s):
- 1719875
- Publication Date:
- NSF-PAR ID:
- 10366316
- Journal Name:
- Applied Physics Letters
- Volume:
- 120
- Issue:
- 15
- Page Range or eLocation-ID:
- Article No. 152901
- ISSN:
- 0003-6951
- Publisher:
- American Institute of Physics
- Sponsoring Org:
- National Science Foundation
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