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1. Interfacing photonic crystal fiber with a metallic nanoantenna for enhanced light nanofocusing

   https://doi.org/10.1364/PRJ.411583  

   Minn, Khant; Birmingham, Blake; Ko, Brian; Lee, Ho Wai Howard; Zhang, Zhenrong (February 2021, Photonics Research)

   The direct interfacing of photonic crystal fiber to a metallic nanoantenna has widespread application in nanoscale imaging, optical lithography, nanoscale lasers, quantum communication,in vivosensing, and medical surgery. We report on the fabrication of a needle-shaped plasmonic nanoantenna on the end facet of a photonic crystal fiber using electron-beam-induced evaporation of platinum. We demonstrate the coupling of light from the fiber waveguide mode to the subwavelength nanoantenna plasmonic mode focusing down to the apex of the plasmonic needle using a polarization-resolved far-field side-scatter imaging technique. Our work provides an important step toward widespread application of optical fibers in nearfield spectroscopic techniques such as tip-enhanced Raman and fluorescence microscopy, single-photon excitation and quantum sensors, nanoscale optical lithography, and lab-on-fiber devices. 

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2. Low-loss fiber-to-chip interface for lithium niobate photonic integrated circuits

   Lingyan He, Mian Zhang (January 2019, Optics letters)

   Integrated lithium niobate (LN) photonic circuits have recently emerged as a promising candidate for advanced photonic functions such as high-speed modulation, nonlinear frequency conversion, and frequency comb generation. For practical applications, optical interfaces that feature low fiber-to-chip coupling losses are essential. So far, the fiber-to-chip loss (commonly >10  dB/facet) has dominated the total insertion losses of typical LN photonic integrated circuits, where on-chip losses can be as low as 0.03–0.1 dB/cm. Here we experimentally demonstrate a low-loss mode size converter for coupling between a standard lensed fiber and sub-micrometer LN rib waveguides. The coupler consists of two inverse tapers that convert the small optical mode of a rib waveguide into a symmetrically guided mode of a LN nanowire, featuring a larger mode area matched to that of a tapered optical fiber. The measured fiber-to-chip coupling loss is lower than 1.7 dB/facet with high fabrication tolerance and repeatability. Our results open the door for practical integrated LN photonic circuits efficiently interfaced with optical fibers. 

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3. Low-loss fiber-to-chip interface for lithium niobate photonic integrated circuits

   https://doi.org/10.1364/OL.44.002314  

   He, Lingyan; Zhang, Mian; Shams-Ansari, Amirhassan; Zhu, Rongrong; Wang, Cheng; Marko, Lončar (April 2019, Optics Letters)

   Integrated lithium niobate (LN) photonic circuits have recently emerged as a promising candidate for advanced photonic functions such as high-speed modulation, nonlinear frequency conversion, and frequency comb generation. For practical applications, optical interfaces that feature low fiber-to-chip coupling losses are essential. So far, the fiber-to-chip loss (commonly $>10\mathrm{dB}/\text{facet}$) has dominated the total insertion losses of typical LN photonic integrated circuits, where on-chip losses can be as low as 0.03–0.1 dB/cm. Here we experimentally demonstrate a low-loss mode size converter for coupling between a standard lensed fiber and sub-micrometer LN rib waveguides. The coupler consists of two inverse tapers that convert the small optical mode of a rib waveguide into a symmetrically guided mode of a LN nanowire, featuring a larger mode area matched to that of a tapered optical fiber. The measured fiber-to-chip coupling loss is lower than 1.7 dB/facet with high fabrication tolerance and repeatability. Our results open the door for practical integrated LN photonic circuits efficiently interfaced with optical fibers. 

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4. Wafer-scale waveguide sidewall roughness scattering loss characterization by image processing

   https://doi.org/10.1364/OE.558186  

   Khurana, Mohit; Delfan, Sahar; Yi, Zhenhuan (May 2025, Optics Express)

   Photonic integrated circuits (PICs) are vital for developing affordable, high-performance optoelectronic devices that can be manufactured at an industrial scale, driving innovation and efficiency in various applications. Optical loss of modes in thin film waveguides and devices is a critical measure of their performance. Thin film growth, lithography, masking, and etching processes are imperfect processes that introduce significant sidewall and top-surface roughness and cause dominating optical losses in waveguides and photonic structures. This roughness, as perturbations couple light from guided to far-field radiation modes, leads to scattering losses that can be estimated from theoretical models. Typically, with UV-based lithography, sidewall roughness is significantly larger than wafer-top surface roughness. Atomic force microscopy (AFM) imaging measurement gives a 3D and high-resolution roughness profile, but the measurement is inconvenient, costly, and unscalable for large-scale PICs and at wafer-scale. Here, we evaluate the sidewall roughness profile based on 2D high-resolution scanning electron microscope (SEM) imaging. We characterized the loss on two homemade nitride and oxide films on 3-inch silicon wafers with 12 waveguide devices on each and correlated the scattering loss estimated from a 2D image-based sidewall profile and theoretical Payne model. The lowest loss of guided fundamental transverse electric (TE₀) mode is found at 0.075 dB/cm at 633 nm across 24 devices, a record at visible wavelength. Our work shows 100% success (edge continuity span exceeding 95% of image width/height) in edge detection in image processing of all images to estimate autocorrelation function and optical mode loss. These demonstrations offer valuable insights into waveguide sidewall roughness and a comparison of experimental and 2D SEM image processing based loss estimations with applications in loss characterization at wafer-scale PICs. 

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5. Free-standing silicon nitride nanobeams with an efficient fiber-chip interface for cavity QED

   https://doi.org/10.1364/OME.411219  

   Alajlan, Abdulrahman; Khurana, Mohit; Liu, Xiaohan; Cojocaru, Ivan; Akimov, Alexey_V (November 2020, Optical Materials Express)

   We present the design, fabrication and characterization of high quality factor silicon nitride nanobeam PhC cavities at visible wavelengths for coupling to diamond color centers in a cavity QED system. We demonstrate devices with a quality factor of ∼24, 000 (±250) around the zero-phonon line of the germanium-vacancy center in diamond. We also present an efficient fiber-to-waveguide coupling platform for suspended nanophotonics. By gently changing the corresponding effective indices at the fiber-waveguide interface, we achieve a coupling efficiency of ∼96% (±2%) at the cavity resonance. 

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