Hsain, Hanan Alexandra, Lee, Younghwan, Lancaster, Suzanne, Materano, Monica, Alcala, Ruben, Xu, Bohan, Mikolajick, Thomas, Schroeder, Uwe, Parsons, Gregory N., and Jones, Jacob L. Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia–Zirconia Thin Films. Retrieved from https://par.nsf.gov/biblio/10384188. ACS Applied Materials & Interfaces 14.37 Web. doi:10.1021/acsami.2c11073.

Hsain, Hanan Alexandra, Lee, Younghwan, Lancaster, Suzanne, Materano, Monica, Alcala, Ruben, Xu, Bohan, Mikolajick, Thomas, Schroeder, Uwe, Parsons, Gregory N., & Jones, Jacob L. Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia–Zirconia Thin Films. ACS Applied Materials & Interfaces, 14 (37). Retrieved from https://par.nsf.gov/biblio/10384188. https://doi.org/10.1021/acsami.2c11073

Hsain, Hanan Alexandra, Lee, Younghwan, Lancaster, Suzanne, Materano, Monica, Alcala, Ruben, Xu, Bohan, Mikolajick, Thomas, Schroeder, Uwe, Parsons, Gregory N., and Jones, Jacob L. "Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia–Zirconia Thin Films". ACS Applied Materials & Interfaces 14 (37). Country unknown/Code not available. https://doi.org/10.1021/acsami.2c11073. https://par.nsf.gov/biblio/10384188.

@article{osti_10384188,
place = {Country unknown/Code not available}, title = {Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia–Zirconia Thin Films}, url = {https://par.nsf.gov/biblio/10384188}, DOI = {10.1021/acsami.2c11073}, abstractNote = {}, journal = {ACS Applied Materials & Interfaces}, volume = {14}, number = {37}, author = {Hsain, Hanan Alexandra and Lee, Younghwan and Lancaster, Suzanne and Materano, Monica and Alcala, Ruben and Xu, Bohan and Mikolajick, Thomas and Schroeder, Uwe and Parsons, Gregory N. and Jones, Jacob L.}, }