Sun, Mingman, Cheng, He, Golvari, Pooria, Kuebler, Stephen M., Yu, Xiaoming, and Zhang, Meng. Modeling of two-photon polymerization in the strong-pulse regime. Retrieved from https://par.nsf.gov/biblio/10386549. Additive Manufacturing 60.PA Web. doi:10.1016/j.addma.2022.103241.
Sun, Mingman, Cheng, He, Golvari, Pooria, Kuebler, Stephen M., Yu, Xiaoming, & Zhang, Meng. Modeling of two-photon polymerization in the strong-pulse regime. Additive Manufacturing, 60 (PA). Retrieved from https://par.nsf.gov/biblio/10386549. https://doi.org/10.1016/j.addma.2022.103241
@article{osti_10386549,
place = {Country unknown/Code not available},
title = {Modeling of two-photon polymerization in the strong-pulse regime},
url = {https://par.nsf.gov/biblio/10386549},
DOI = {10.1016/j.addma.2022.103241},
abstractNote = {},
journal = {Additive Manufacturing},
volume = {60},
number = {PA},
author = {Sun, Mingman and Cheng, He and Golvari, Pooria and Kuebler, Stephen M. and Yu, Xiaoming and Zhang, Meng},
}
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