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  • Impacts of ruthenium valence state on the electrocatalytic activity of ruthenium ion-complexed graphitic carbon nitride/reduced graphene oxide nanosheets towards hydrogen evolution reaction
Title: Impacts of ruthenium valence state on the electrocatalytic activity of ruthenium ion-complexed graphitic carbon nitride/reduced graphene oxide nanosheets towards hydrogen evolution reaction
Award ID(s):
1900235 2003685
PAR ID:
10388379
Author(s) / Creator(s):
; ; ; ; ; ; ;
Date Published:
Journal Name:
Journal of Colloid and Interface Science
Volume:
629
Issue:
PB
ISSN:
0021-9797
Page Range / eLocation ID:
591 to 597
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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  1. ; (, Journal of The Electrochemical Society)
    A novel process for the electrochemical atomic layer etching (e-ALE) of ruthenium (Ru) is described. In this process, the surface Ru is electrochemically oxidized to form a monolayer of ruthenium (III) hydroxide—Ru(OH)3. The Ru(OH)3monolayer is then selectively etched in an electrolyte containing chloride (Cl–) species. This etching process is selective towards Ru(OH)3and does not attack the underlying Ru metal. Adsorbed Cl–on the Ru electrode is then cathodically desorbed before the sequence of Ru oxidation and Ru(OH)3etching is repeated. This e-ALE sequence is shown to etch Ru at approximately 0.5 monolayer per cycle while practically avoiding any surface roughness amplification. The proposed Ru e-ALE process uses a single electrolyte which eliminates the need for electrode transfer or electrolyte switching between process steps. In this report, we employ electrochemical, microscopic and spectroscopic techniques to gain insights into the various characteristics of the Ru e-ALE process. 
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  2. ; ; ; ; (, Journal of The Electrochemical Society)
    The electrodeposition of Ru was investigated from solutions of ruthenium(III) nitrosyl sulfate and ruthenium(III) chloride onto seed layers of epitaxial and polycrystalline Ru and epitaxial Au. Using both galvanostatic and potentiostatic deposition modes, metallic Ru was found to electrodeposit as a porous layer comprised of (0001) oriented Ru crystallites, the presence of which was discovered and confirmed by X-ray and scanning transmission and transmission electron microscope (S/TEM) analyses. This finding was independent of the Ru salt and seed layer used. Using X-ray reflectivity (XRR), the average film density ρ e f f of the porous electrodeposited Ru layer was measured as less than the density of bulk Ru ρ R u , b u l k (14.414 g cm−3). Increasing the magnitude of the applied current density from −100μA cm−2to −10 mA cm−2in solutions of Ru nitrosyl sulfate increased the ρ e f f from 7.4 g cm−3to 9.7 g cm−2while the current efficiency decreased from 9.4% to 4.3%. 
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  3. ; ; (, Organometallics)
  4. ; ; ; ; ; ; (, Organic Process Research & Development)
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  5. ; ; (, Organic Letters)
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