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Title: High Aspect Ratio Glass Microstructures by Laser Induced Etching
Laser Induced Deep Etching (LIDE®), developed by LPKF, is a maskless laser processing method capable of patterning glass microstructures similar to microfluidics created by PDMS soft lithography. Here, we demonstrate a self-digitized droplet microfluidics chip with high aspect-ratio features and fine resolution via the LIDE® technology. LIDE® provides the means to translate microfluidic designs into glass in a process suitable for low-cost and high-volume manufacturing.  more » « less
Award ID(s):
1841509
NSF-PAR ID:
10390308
Author(s) / Creator(s):
; ;
Date Published:
Journal Name:
IEEE EMBS Micro and Nanotechnology in Medicine Conference (MNMC)
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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