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High Aspect Ratio Glass Microstructures by Laser Induced Etching
Laser Induced Deep Etching (LIDE®), developed by LPKF, is a maskless laser processing method capable of patterning glass microstructures similar to microfluidics created by PDMS soft lithography. Here, we demonstrate a self-digitized droplet microfluidics chip with high aspect-ratio features and fine resolution via the LIDE® technology. LIDE® provides the means to translate microfluidic designs into glass in a process suitable for low-cost and high-volume manufacturing.
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- Award ID(s):
- 1841509
- PAR ID:
- 10390308
- Date Published:
- Journal Name:
- IEEE EMBS Micro and Nanotechnology in Medicine Conference (MNMC)
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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