BCl 3 is an attractive plasma etchant for oxides because it is a Lewis acid used to scavenge native oxides on many semiconductors due to the strong B–O bonding. We investigated BCl 3 -based dry etching of the NiO/Ga 2 O 3 heterojunction system. BCl 3 /Ar Inductively Coupled Plasmas produced maximum etch rates for NiO up to 300 Å.min −1 and 800 Å.min −1 for β -Ga 2 O 3 under moderate plasma power conditions suitable for low damage pattern transfer. The selectivity for NiO: Ga 2 O 3 was <1 under all conditions. The ion energy threshold for initiation of etching of NiO was between 35–60 eV, depending on the condition and the etch mechanism was ion-driven, as determined by the linear dependence of etch rate on the square root of ion energy incident on the surface. By sharp contrast, the etching of Ga 2 O 3 had a stronger chemical component, without a well-defined ion energy threshold. The as-etched NiO and Ga 2 O 3 surfaces show chlorine residues, which can be removed on both materials by the standard 1NH 4 OH: 10H 2 O or 1HCl: 10H 2 O rinses used for native oxide removal. According to the location of the Cl 2p 3/2 peak, the Cl is ionically bonded.
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Synthesis, chiral crystal structure, and magnetic properties of Ba 3 Ga 2 O 5 Cl 2
A new compound, Ba 3 Ga 2 O 5 Cl 2 , isostructural with Ba 3 Fe 2 O 5 Cl 2 , was synthesized by solid-state reaction in air. Through single-crystal and powder X-ray diffraction analysis, the crystal structure was determined to be cubic with chiral space group I 2 1 3 and unit-cell parameter a = 9.928 (1) Å. The Ga 3+ ions in Ba 3 Ga 2 O 5 Cl 2 are coordinated by O atoms and form GaO 4 tetrahedra. Ten neighboring GaO 4 tetrahedra are further bridged through corner sharing and rotation along the body diagonal, producing the chiral structure. Magnetization measurements indicate temperature-independent diamagnetic behavior, which is qualitatively consistent with core diamagnetism from all the constituent elements.
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- Award ID(s):
- 2053287
- PAR ID:
- 10398908
- Date Published:
- Journal Name:
- Acta Crystallographica Section B Structural Science, Crystal Engineering and Materials
- Volume:
- 78
- Issue:
- 4
- ISSN:
- 2052-5206
- Page Range / eLocation ID:
- 589 to 592
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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