Deng, Jingyuan, Bailey, Sean, Jiang, Shaoyi, and Ober, Christopher K. Modular Synthesis of Phthalaldehyde Derivatives Enabling Access to Photoacid Generator-Bound Self-Immolative Polymer Resists with Next-Generation Photolithographic Properties. Retrieved from https://par.nsf.gov/biblio/10411622. Journal of the American Chemical Society 144.42 Web. doi:10.1021/jacs.2c08202.

Deng, Jingyuan, Bailey, Sean, Jiang, Shaoyi, & Ober, Christopher K. Modular Synthesis of Phthalaldehyde Derivatives Enabling Access to Photoacid Generator-Bound Self-Immolative Polymer Resists with Next-Generation Photolithographic Properties. Journal of the American Chemical Society, 144 (42). Retrieved from https://par.nsf.gov/biblio/10411622. https://doi.org/10.1021/jacs.2c08202

Deng, Jingyuan, Bailey, Sean, Jiang, Shaoyi, and Ober, Christopher K. "Modular Synthesis of Phthalaldehyde Derivatives Enabling Access to Photoacid Generator-Bound Self-Immolative Polymer Resists with Next-Generation Photolithographic Properties". Journal of the American Chemical Society 144 (42). Country unknown/Code not available. https://doi.org/10.1021/jacs.2c08202. https://par.nsf.gov/biblio/10411622.

@article{osti_10411622,
place = {Country unknown/Code not available}, title = {Modular Synthesis of Phthalaldehyde Derivatives Enabling Access to Photoacid Generator-Bound Self-Immolative Polymer Resists with Next-Generation Photolithographic Properties}, url = {https://par.nsf.gov/biblio/10411622}, DOI = {10.1021/jacs.2c08202}, abstractNote = {}, journal = {Journal of the American Chemical Society}, volume = {144}, number = {42}, author = {Deng, Jingyuan and Bailey, Sean and Jiang, Shaoyi and Ober, Christopher K.}, }