Kim, Hyunseok, Lee, Sangho, Shin, Jiho, Zhu, Menglin, Akl, Marx, Lu, Kuangye, Han, Ne Myo, Baek, Yongmin, Chang, Celesta S., Suh, Jun Min, Kim, Ki Seok, Park, Bo-In, Zhang, Yanming, Choi, Chanyeol, Shin, Heechang, Yu, He, Meng, Yuan, Kim, Seung-Il, Seo, Seungju, Lee, Kyusang, Kum, Hyun S., Lee, Jae-Hyun, Ahn, Jong-Hyun, Bae, Sang-Hoon, Hwang, Jinwoo, Shi, Yunfeng, and Kim, Jeehwan. Graphene nanopattern as a universal epitaxy platform for single-crystal membrane production and defect reduction. Retrieved from https://par.nsf.gov/biblio/10412044. Nature Nanotechnology 17.10 Web. doi:10.1038/s41565-022-01200-6.

Kim, Hyunseok, Lee, Sangho, Shin, Jiho, Zhu, Menglin, Akl, Marx, Lu, Kuangye, Han, Ne Myo, Baek, Yongmin, Chang, Celesta S., Suh, Jun Min, Kim, Ki Seok, Park, Bo-In, Zhang, Yanming, Choi, Chanyeol, Shin, Heechang, Yu, He, Meng, Yuan, Kim, Seung-Il, Seo, Seungju, Lee, Kyusang, Kum, Hyun S., Lee, Jae-Hyun, Ahn, Jong-Hyun, Bae, Sang-Hoon, Hwang, Jinwoo, Shi, Yunfeng, & Kim, Jeehwan. Graphene nanopattern as a universal epitaxy platform for single-crystal membrane production and defect reduction. Nature Nanotechnology, 17 (10). Retrieved from https://par.nsf.gov/biblio/10412044. https://doi.org/10.1038/s41565-022-01200-6

Kim, Hyunseok, Lee, Sangho, Shin, Jiho, Zhu, Menglin, Akl, Marx, Lu, Kuangye, Han, Ne Myo, Baek, Yongmin, Chang, Celesta S., Suh, Jun Min, Kim, Ki Seok, Park, Bo-In, Zhang, Yanming, Choi, Chanyeol, Shin, Heechang, Yu, He, Meng, Yuan, Kim, Seung-Il, Seo, Seungju, Lee, Kyusang, Kum, Hyun S., Lee, Jae-Hyun, Ahn, Jong-Hyun, Bae, Sang-Hoon, Hwang, Jinwoo, Shi, Yunfeng, and Kim, Jeehwan. "Graphene nanopattern as a universal epitaxy platform for single-crystal membrane production and defect reduction". Nature Nanotechnology 17 (10). Country unknown/Code not available. https://doi.org/10.1038/s41565-022-01200-6. https://par.nsf.gov/biblio/10412044.

@article{osti_10412044,
place = {Country unknown/Code not available}, title = {Graphene nanopattern as a universal epitaxy platform for single-crystal membrane production and defect reduction}, url = {https://par.nsf.gov/biblio/10412044}, DOI = {10.1038/s41565-022-01200-6}, abstractNote = {}, journal = {Nature Nanotechnology}, volume = {17}, number = {10}, author = {Kim, Hyunseok and Lee, Sangho and Shin, Jiho and Zhu, Menglin and Akl, Marx and Lu, Kuangye and Han, Ne Myo and Baek, Yongmin and Chang, Celesta S. and Suh, Jun Min and Kim, Ki Seok and Park, Bo-In and Zhang, Yanming and Choi, Chanyeol and Shin, Heechang and Yu, He and Meng, Yuan and Kim, Seung-Il and Seo, Seungju and Lee, Kyusang and Kum, Hyun S. and Lee, Jae-Hyun and Ahn, Jong-Hyun and Bae, Sang-Hoon and Hwang, Jinwoo and Shi, Yunfeng and Kim, Jeehwan}, }