Lenef, Julia D., Gayle, Andrew J., Jo, Jaesung, Fuelling, Kalyn M., Yadavalli, Srinivas K., Ortiz-Ortiz, Alondra M., Sun, Kai, Peterson, Rebecca L., and Dasgupta, Neil P. Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange. Retrieved from https://par.nsf.gov/biblio/10414949. Chemistry of Materials 35.6 Web. doi:10.1021/acs.chemmater.2c03773.

Lenef, Julia D., Gayle, Andrew J., Jo, Jaesung, Fuelling, Kalyn M., Yadavalli, Srinivas K., Ortiz-Ortiz, Alondra M., Sun, Kai, Peterson, Rebecca L., & Dasgupta, Neil P. Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange. Chemistry of Materials, 35 (6). Retrieved from https://par.nsf.gov/biblio/10414949. https://doi.org/10.1021/acs.chemmater.2c03773

Lenef, Julia D., Gayle, Andrew J., Jo, Jaesung, Fuelling, Kalyn M., Yadavalli, Srinivas K., Ortiz-Ortiz, Alondra M., Sun, Kai, Peterson, Rebecca L., and Dasgupta, Neil P. "Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange". Chemistry of Materials 35 (6). Country unknown/Code not available. https://doi.org/10.1021/acs.chemmater.2c03773. https://par.nsf.gov/biblio/10414949.

@article{osti_10414949,
place = {Country unknown/Code not available}, title = {Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange}, url = {https://par.nsf.gov/biblio/10414949}, DOI = {10.1021/acs.chemmater.2c03773}, abstractNote = {}, journal = {Chemistry of Materials}, volume = {35}, number = {6}, author = {Lenef, Julia D. and Gayle, Andrew J. and Jo, Jaesung and Fuelling, Kalyn M. and Yadavalli, Srinivas K. and Ortiz-Ortiz, Alondra M. and Sun, Kai and Peterson, Rebecca L. and Dasgupta, Neil P.}, }