Xia, Zehui, Scott, Andre, Keneipp, Rachael, Chen, Joshua, Niedzwiecki, David J., DiPaolo, Brian, and Drndić, Marija. Silicon Nitride Nanopores Formed by Simple Chemical Etching: DNA Translocations and TEM Imaging. Retrieved from https://par.nsf.gov/biblio/10414982. ACS Nano 16.11 Web. doi:10.1021/acsnano.2c07240.

Xia, Zehui, Scott, Andre, Keneipp, Rachael, Chen, Joshua, Niedzwiecki, David J., DiPaolo, Brian, & Drndić, Marija. Silicon Nitride Nanopores Formed by Simple Chemical Etching: DNA Translocations and TEM Imaging. ACS Nano, 16 (11). Retrieved from https://par.nsf.gov/biblio/10414982. https://doi.org/10.1021/acsnano.2c07240

Xia, Zehui, Scott, Andre, Keneipp, Rachael, Chen, Joshua, Niedzwiecki, David J., DiPaolo, Brian, and Drndić, Marija. "Silicon Nitride Nanopores Formed by Simple Chemical Etching: DNA Translocations and TEM Imaging". ACS Nano 16 (11). Country unknown/Code not available. https://doi.org/10.1021/acsnano.2c07240. https://par.nsf.gov/biblio/10414982.

@article{osti_10414982,
place = {Country unknown/Code not available}, title = {Silicon Nitride Nanopores Formed by Simple Chemical Etching: DNA Translocations and TEM Imaging}, url = {https://par.nsf.gov/biblio/10414982}, DOI = {10.1021/acsnano.2c07240}, abstractNote = {}, journal = {ACS Nano}, volume = {16}, number = {11}, author = {Xia, Zehui and Scott, Andre and Keneipp, Rachael and Chen, Joshua and Niedzwiecki, David J. and DiPaolo, Brian and Drndić, Marija}, }