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Optimizing thermal anneals of Si-implanted β-Ga2O3 is critical for low resistance contacts and selective area doping. We report the impact of annealing ambient, temperature, and time on the activation of room temperature ion-implanted Si in β-Ga2O3 at concentrations from 5 × 1018 to 1 × 1020 cm−3, demonstrating full activation (>80% activation, mobilities >70 cm2/V s) with contact resistances below 0.29 Ω mm. Homoepitaxial β-Ga2O3 films, grown by plasma-assisted molecular beam epitaxy on Fe-doped (010) substrates, were implanted at multiple energies to yield 100 nm box profiles of 5 × 1018, 5 × 1019, and 1 × 1020 cm−3. Anneals were performed in an ultra-high vacuum-compatible quartz furnace at 1 bar with well-controlled gas compositions. To maintain β-Ga2O3 stability, pO2 must be greater than 10−9 bar. Anneals up to pO2 = 1 bar achieve full activation at 5 × 1018 cm−3, while 5 × 1019 cm−3 must be annealed with pO2 ≤ 10−4 bar, and 1 × 1020 cm−3 requires pO2 < 10−6 bar. Water vapor prevents activation and must be maintained below 10−8 bar. Activation is achieved for anneal temperatures as low as 850 °C with mobility increasing with anneal temperatures up to 1050 °C, though Si diffusion has been reported above 950 °C. At 950 °C, activation is maximized between 5 and 20 min with longer times resulting in decreased carrier activation (over-annealing). This over-annealing is significant for concentrations above 5 × 1019 cm−3 and occurs rapidly at 1 × 1020 cm−3. Rutherford backscattering spectrometry (channeling) suggests that damage recovery is seeded from remnant aligned β-Ga2O3 that remains after implantation; this conclusion is also supported by scanning transmission electron microscopy showing retention of the β-phase with inclusions that resemble the γ-phase.
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Effects of temperature and oxygen partial pressure on electrical conductivity of Fe-doped β -Ga2O3 single crystals
In this work, we measure DC and AC conductivity and Hall voltage to determine the origin of electrical insulating properties of Fe-doped β-Ga2O3 single crystals, which are measured perpendicular to the 2¯01 crystallographic plane. We find that electrical conduction is predominantly controlled by free electrons in the temperature range 230–800 °C with the mutual compensation of the impurity donor (Si) and acceptor dopant (Fe), explaining the low concentration of free electrons and Fermi level pinning over a wide range of temperatures. Furthermore, the negative temperature-dependence of the carrier mobility indicates that it is limited by optical phonon scattering. Importantly, we find electrical conductivity to be largely independent of oxygen partial pressure (pO2) from air to 10−4 atm at 600 °C, but it becomes slightly dependent on pO2 at 800 °C, as intrinsic non-stoichiometric point defects begin to influence the charge balance.
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- Award ID(s):
- 1653383
- PAR ID:
- 10437318
- Date Published:
- Journal Name:
- Applied Physics Letters
- Volume:
- 120
- Issue:
- 18
- ISSN:
- 0003-6951
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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- Free Publicly Accessible Full Text
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Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.1063/5.0093588
