Characterizing HfO 2 -Based Ferroelectric Tunnel Junction in Cryogenic Temperature
- Award ID(s):
- 2218604
- PAR ID:
- 10442395
- Date Published:
- Journal Name:
- IEEE Transactions on Electron Devices
- Volume:
- 69
- Issue:
- 10
- ISSN:
- 0018-9383
- Page Range / eLocation ID:
- 5948 to 5951
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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