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  • 2D-imaging of absolute OH and H 2 O 2 profiles in a He–H 2 O nanosecond pulsed dielectric barrier discharge by photo-fragmentation laser-induced fluorescence
Title: 2D-imaging of absolute OH and H 2 O 2 profiles in a He–H 2 O nanosecond pulsed dielectric barrier discharge by photo-fragmentation laser-induced fluorescence
Abstract Pulsed dielectric barrier discharges (DBD) in He–H 2 O and He–H 2 O–O 2 mixtures are studied in near atmospheric conditions using temporally and spatially resolved quantitative 2D imaging of the hydroxyl radical (OH) and hydrogen peroxide (H 2 O 2 ). The primary goal was to detect and quantify the production of these strongly oxidative species in water-laden helium discharges in a DBD jet configuration, which is of interest for biomedical applications such as disinfection of surfaces and treatment of biological samples. Hydroxyl profiles are obtained by laser-induced fluorescence (LIF) measurements using 282 nm laser excitation. Hydrogen peroxide profiles are measured by photo-fragmentation LIF (PF-LIF), which involves photo-dissociating H 2 O 2 into OH with a 212.8 nm laser sheet and detecting the OH fragments by LIF. The H 2 O 2 profiles are calibrated by measuring PF-LIF profiles in a reference mixture of He seeded with a known amount of H 2 O 2 . OH profiles are calibrated by measuring OH-radical decay times and comparing these with predictions from a chemical kinetics model. Two different burst discharge modes with five and ten pulses per burst are studied, both with a burst repetition rate of 50 Hz. In both cases, dynamics of OH and H 2 O 2 distributions in the afterglow of the discharge are investigated. Gas temperatures determined from the OH-LIF spectra indicate that gas heating due to the plasma is insignificant. The addition of 5% O 2 in the He admixture decreases the OH densities and increases the H 2 O 2 densities. The increased coupled energy in the ten-pulse discharge increases OH and H 2 O 2 mole fractions, except for the H 2 O 2 in the He–H 2 O–O 2 mixture which is relatively insensitive to the additional pulses.  more » « less
Award ID(s):
2029425
PAR ID:
10465967
Author(s) / Creator(s):
; ; ; ;
Date Published:
Journal Name:
Plasma Sources Science and Technology
Volume:
32
Issue:
1
ISSN:
0963-0252
Page Range / eLocation ID:
015006
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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