Rubbi, Fazlay, Zhang, Xing, Delzendehrooy, Fatemeh, Mao, Bo, Nian, Qiong, Doumanidis, Charalabos C., and Liao, Yiliang. Chemical etching enhanced nanosecond pulsed laser micromachining: An experimental and numerical investigation. Retrieved from https://par.nsf.gov/biblio/10477060. Journal of Manufacturing Processes 108.C Web. doi:10.1016/j.jmapro.2023.11.017.

Rubbi, Fazlay, Zhang, Xing, Delzendehrooy, Fatemeh, Mao, Bo, Nian, Qiong, Doumanidis, Charalabos C., & Liao, Yiliang. Chemical etching enhanced nanosecond pulsed laser micromachining: An experimental and numerical investigation. Journal of Manufacturing Processes, 108 (C). Retrieved from https://par.nsf.gov/biblio/10477060. https://doi.org/10.1016/j.jmapro.2023.11.017

Rubbi, Fazlay, Zhang, Xing, Delzendehrooy, Fatemeh, Mao, Bo, Nian, Qiong, Doumanidis, Charalabos C., and Liao, Yiliang. "Chemical etching enhanced nanosecond pulsed laser micromachining: An experimental and numerical investigation". Journal of Manufacturing Processes 108 (C). Country unknown/Code not available: SME. https://doi.org/10.1016/j.jmapro.2023.11.017. https://par.nsf.gov/biblio/10477060.

@article{osti_10477060,
place = {Country unknown/Code not available}, title = {Chemical etching enhanced nanosecond pulsed laser micromachining: An experimental and numerical investigation}, url = {https://par.nsf.gov/biblio/10477060}, DOI = {10.1016/j.jmapro.2023.11.017}, abstractNote = {}, journal = {Journal of Manufacturing Processes}, volume = {108}, number = {C}, publisher = {SME}, author = {Rubbi, Fazlay and Zhang, Xing and Delzendehrooy, Fatemeh and Mao, Bo and Nian, Qiong and Doumanidis, Charalabos C. and Liao, Yiliang}, }