Abstract Carbon‐centered radicals stabilized by adjacent boron atoms are underexplored reaction intermediates in organic synthesis. This study reports the development of vinyl cyclopropyl diborons (VCPDBs) as a versatile source of previously unknown homoallylic α,α‐diboryl radicals via thiyl radical catalyzed diboron‐directed ring opening. These diboryl stabilized radicals underwent smooth [3+2] cycloaddition with a variety of olefins to provide diboryl cyclopentanes in good to excellent diastereoselectivity. In contrast to thetrans‐diastereoselectivity observed with most of the dicarbonyl activated VCPs, the cycloaddition of VCPDBs showed a remarkable preference for formation ofcis‐cyclopentane diastereomer which was confirmed by quantitative NOE and 2D NOESY studies. Thecis‐stereochemistry of cyclopentane products enabled a concise intramolecular Heck reaction approach to rare tricyclic cyclopentanoid framework containing the diboron group. The mild reaction conditions also allowed a one‐pot VCP ring‐opening, cycloaddition‐oxidation sequence to afford disubstituted cyclopentanones. Control experiments and DFT analysis of reaction mechanism support a radical mediated pathway and provide a rationale for the observed diastereoselectivity. To the authors’ knowledge, these are the first examples of the use of geminal diboryl group as an activator of VCP ring opening and cycloaddition reaction of α‐boryl radicals. 
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                            Covalent Adaptable Networks with Rapid UV Response Based on Reversible Thiol–Ene Reactions in Silicone Elastomers
                        
                    
    
            PhotoCAN silicone elastomers, based on the thiol–ene reaction, exhibit rapid and reversible changes in dynamic modulus at room temperature when illuminated by UV. By combining results from magic angle spinning solid-state NMR as well as EPR and rheometry measurements, both under UV, it is concluded that the mechanical response can be attributed to a combination of dissociative, associative, and oxidation reactions. The cleavage of the C–S bonds under UV in the presence of an excess of thiyl radicals is identified as the reversible dissociative reaction responsible for abrupt drops in the storage modulus. A slower but concurrent reaction is a termination process involving thiyl radicals to form disulfide bonds. A kinetic model is developed that successfully relates the rates of the underlying reaction mechanisms to changes in the storage modulus. The results provide a basis for designing new, ambient temperature photoresponsive covalently adaptive network materials. 
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                            - Award ID(s):
- 2011754
- PAR ID:
- 10500441
- Publisher / Repository:
- ACS
- Date Published:
- Journal Name:
- Macromolecules
- Volume:
- 56
- Issue:
- 22
- ISSN:
- 0024-9297
- Page Range / eLocation ID:
- 9107 to 9116
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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