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This content will become publicly available on April 30, 2025

Title: Ultrathin and Deformable Graphene Etch Mask for Fabrication of 3D Microstructures
Award ID(s):
2309037 1720633
PAR ID:
10505937
Author(s) / Creator(s):
; ; ; ;
Publisher / Repository:
American Chemical Society
Date Published:
Journal Name:
ACS Nano
ISSN:
1936-0851
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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