Kim, Jiwoo, Moon, Donghoon, Kim, Hyunchul, van der Zande, Arend M., and Lee, Gwan-Hyoung. Ultrathin and Deformable Graphene Etch Mask for Fabrication of 3D Microstructures. Retrieved from https://par.nsf.gov/biblio/10505937. ACS Nano . Web. doi:10.1021/acsnano.4c01279.
Kim, Jiwoo, Moon, Donghoon, Kim, Hyunchul, van der Zande, Arend M., & Lee, Gwan-Hyoung. Ultrathin and Deformable Graphene Etch Mask for Fabrication of 3D Microstructures. ACS Nano, (). Retrieved from https://par.nsf.gov/biblio/10505937. https://doi.org/10.1021/acsnano.4c01279
Kim, Jiwoo, Moon, Donghoon, Kim, Hyunchul, van der Zande, Arend M., and Lee, Gwan-Hyoung.
"Ultrathin and Deformable Graphene Etch Mask for Fabrication of 3D Microstructures". ACS Nano (). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsnano.4c01279.https://par.nsf.gov/biblio/10505937.
@article{osti_10505937,
place = {Country unknown/Code not available},
title = {Ultrathin and Deformable Graphene Etch Mask for Fabrication of 3D Microstructures},
url = {https://par.nsf.gov/biblio/10505937},
DOI = {10.1021/acsnano.4c01279},
abstractNote = {},
journal = {ACS Nano},
publisher = {American Chemical Society},
author = {Kim, Jiwoo and Moon, Donghoon and Kim, Hyunchul and van der Zande, Arend M. and Lee, Gwan-Hyoung},
}
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