Abstract Adducts between OsO4and Lewis bases exert a role in important oxidation processes such as epoxidation and dihydroxylation. It has been shown that the attractive interaction driving the formation of these adducts is a σ‐hole bond involving the metal as the electrophilic species; the term Osme Bond (OmB) was proposed for designating it. Here some new adducts between OsO4and various bases have been characterized through single crystal x‐ray diffraction (XRD) and computational studies (density functional theory, DFT), confirming the existence of a robust correlation between σ‐hole interaction energy and deformation of the tetrahedral geometry of OsO4. Also, some adducts formed by RuO4with nucleophiles were investigated computationally.
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Examining the reactivity of tris(ortho-carboranyl)borane with Lewis bases and application in frustrated Lewis pair Si–H bond cleavage
Reactions of tris(ortho-carboranyl)borane with Lewis bases reveals only small bases bind. The tremendous bulk and Lewis acidity is leveraged in frustrated Lewis pair Si–H cleavage with a wider range of Lewis bases and greater efficacy than B(C6F5)3.
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- Award ID(s):
- 1753025
- PAR ID:
- 10523397
- Publisher / Repository:
- Royal Society of Chemistry
- Date Published:
- Journal Name:
- Dalton Transactions
- Volume:
- 52
- Issue:
- 28
- ISSN:
- 1477-9226
- Page Range / eLocation ID:
- 9639 to 9645
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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