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Title: Study of graphene p-n junctions formed by the electrostatic modification of the SiO2 substrate
Abstract

We study the transport properties of mm-scale CVD graphene p-n junctions, which are formed in a single gated graphene field effect transistor configuration. Here, an electrical-stressing-voltage technique served to modify the electrostatic potential in the SiO2/Si substrate and create the p-n junction. We examine the transport characteristics about the Dirac points that are localized in the perturbed and unperturbed regions in the graphene channel and note the quantitative differences in the Hall effect between the perturbed and unperturbed regions. The results also show that the longitudinal resistance is highly sensitive to the external magnetic field when the Hall bar device operates as a p-n junction.

 
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Award ID(s):
2210180
NSF-PAR ID:
10524769
Author(s) / Creator(s):
; ; ;
Publisher / Repository:
Nature Journals
Date Published:
Journal Name:
Scientific Reports
Volume:
14
Issue:
1
ISSN:
2045-2322
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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