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1. Inhibition of atomic layer deposition of TiO2 by functionalizing silicon surface with 4-fluorophenylboronic acid

   https://doi.org/10.1116/6.0003316  

   Silva-Quinones, Dhamelyz; Mason, John R; Norden, Robert; Teplyakov, Andrew V (May 2024, Journal of Vacuum Science & Technology A)

   As the size of the components in electronic devices decreases, new approaches and chemical modification schemes are needed to produce nanometer-size features with bottom-up manufacturing. Organic monolayers can be used as effective resists to block the growth of materials on non-growth substrates in area-selective deposition methods. However, choosing the appropriate surface modification requires knowledge of the corresponding chemistry and also a detailed investigation of the behavior of the functionalized surface in realistic deposition schemes. This study aims to investigate the chemistry of boronic acids that can be used to prepare such non-growth areas on elemental semiconductors. 4-Fluorophenylboronic acid is used as a model to investigate the possibility to utilize the Si(100) surface functionalized with this compound as a non-growth substrate in a titanium dioxide (TiO2) deposition scheme based on sequential doses of tetrakis(dimethylamido)titanium and water. A combination of X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry allows for a better understanding of the process. The resulting surface is shown to be an effective non-growth area to TiO2 deposition when compared to currently used H-terminated silicon surfaces but to exhibit much higher stability in ambient conditions. 

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2. Preparation of Br-terminated Si(100) and Si(111) surfaces and their use as atomic layer deposition resists

   https://doi.org/10.1116/6.0003941  

   Mason, John R; Teplyakov, Andrew V (December 2024, Journal of Vacuum Science & Technology A)

   In area-selective processes, such as area-selective atomic layer deposition (AS-ALD), there is renewed interest in designing surface modification schemes allowing to tune the reactivity of the nongrowth (NG) substrates. Many efforts are directed toward small molecule inhibitors or atomic layers, which would modify selected surfaces to delay nucleation and provide NG properties in the target AS-ALD processes allowing for the manufacturing of smaller sized features than those produced with alternative approaches. Bromine termination of silicon surfaces, specifically Si(100) and Si(111), is evaluated as a potential pathway to design NG substrates for the deposition of metal oxides, and TiO2 (from cycles of sequential exposures of tetrakis-dimethylamido-titanium and water) is tested as a prototypical deposition material. Nucleation delays on the surfaces produced are comparable to those on H-terminated silicon that is commonly used as an NG substrate. However, the silicon surfaces produced by bromination are more stable, and even oxidation does not change their chemical reactivity substantially. Once the NG surface is eventually overgrown after a large number of ALD cycles, bromine remains at the interface between silicon and TiO2. The NG behavior of different crystal faces of silicon appears to be similar, albeit not identical, despite different arrangements and coverage of bromine atoms. 

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3. Synthesis and crystal structure of a bench-stable pyridinium ketene hemiaminal: 1-(1-ethoxyethenyl)-2-[methyl(phenyl)amino]pyridin-1-ium trifluoromethanesulfonate

   https://doi.org/10.1107/S2056989023005741  

   Krevlin, Z; Bote, I; Crespo, M; Lam, C; McMillen, C; Majireck, M (August 2023, Acta Crystallographica Section E Crystallographic Communications)

   The novel bench-stableN-quaternized keteneN,O-acetal, C₁₆H₁₉N₂O⁺·CF₃O₃S⁻, was synthesized and its structure determined. The title compound is a rare example of a pyridinium ketene hemiaminal for which a crystal structure has been determined, joining the 2-chloro-1-(1-ethyoxyethenyl)pyridin-1-ium trifluoromethanesulfonate salt from which it was synthesized. The cationic species of the title compound can be defined by three individually planar fragments assembling into a non-coplanar cation. The phenyl substituent extending from the amino nitrogen atom and the ethyoxyvinyl substituent extending from the pyridine N atom are oriented on the same side of the molecule and maintain the closest coplanar relationship of the three fragments. Supramolecular interactions are dominated by C—H...O interactions from the cation to the SO₃side of the trifluoromethanesulfonate anion, forming a two-dimensional substructure. 

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4. Synthesis of acyl(chloro)phosphines enabled by phosphinidene transfer

   https://doi.org/10.1039/c8sc05657a  

   Szkop, Kevin M.; Geeson, Michael B.; Stephan, Douglas W.; Cummins, Christopher C. (March 2019, Chemical Science)

   Acyl(chloro)phosphines RC(O)P(Cl)( t -Bu) have been prepared by formal insertion of tert -butyl phosphinidene ( t -Bu–P) from t -BuP A ( A = C 14 H 10 or anthracene) into the C–Cl bond of acyl chlorides. We show that the under-explored acyl(chloro)phosphine functional group provides an efficient method to prepare bis(acyl)phosphines, which are important precursors to compounds used industrially as radical polymerization initiators. Experimental and computational investigations into the mechanism of formation of acyl(chloro)phosphines by our synthetic method reveal a pathway in which chloride attacks a phosphonium intermediate and leads to the reductive loss of anthracene from the phosphorus center in a P( v ) to P( iii ) process. The synthetic applicability of the acyl(chloro)phosphine functional group has been demonstrated by reduction to an acylphosphide anion, which can in turn be treated with an acyl chloride to furnish dissymmetric bis(acyl)phosphines. 

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5. Crystal and molecular structure of 4-fluoro-1 H -pyrazole at 150 K

   https://doi.org/10.1107/S2056989023003055  

   Ahmed, Basil M.; Zeller, Matthias; Mezei, Gellert (May 2023, Acta Crystallographica Section E Crystallographic Communications)

   Only two 4-halo-1H-pyrazole crystal structures are known to date (chloro and bromo, the structure of 4-iodo-1H-pyrazole has not been reported yet). The triclinic structure of 4-fluoro-1H-pyrazole, C₃H₃FN₂(P\overline{1}), reported here is not isomorphous with those of the chloro and bromo analogues (which are isomorphous, orthorhombicPnma). To avoid sublimation during the measurement, diffraction data were collected at 150 K. Two crystallographically unique 4-fluoro-1H-pyrazole moieties linked by an N—H...N hydrogen bond are found in the asymmetric unit. Unlike the trimeric supramolecular motifs found in the structures of the chloro and bromo analogues, 4-fluoro-1H-pyrazole forms one-dimensional chains by intermolecular hydrogen bonding in the crystal. 

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