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Title: Tuning Young’s modulus in multiphoton lithography
Since Multiphoton Lithography (MPL) is applied as an additive manufacturing technique for the fabrication of operational microsystems, the need to predict the mechanical response of the fabricated structures emerges. This work focuses on determining the Young's Modulus of structures fabricated via MPL. With this objective in mind, two series of experiments were designed and conducted: the first one for the determination of the factors whose impact is significant, and the second one for generating a dataset used in the training of a machine learning tool that will define the suitable set of fabrication parameters for the fabrication of a structure with desired Young's Modulus.  more » « less
Award ID(s):
2124826
PAR ID:
10542975
Author(s) / Creator(s):
;
Editor(s):
Kabashin, Andrei V; Farsari, Maria; Mahjouri-Samani, Masoud
Publisher / Repository:
SPIE
Date Published:
ISBN:
9781510670082
Page Range / eLocation ID:
12
Format(s):
Medium: X
Location:
San Francisco, United States
Sponsoring Org:
National Science Foundation
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