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Abstract In this study, we carry out robust optimal design for the machining operations, one key process in wafer polishing in chip manufacturing, aiming to avoid the peculiar regenerative chatter and maximize the material removal rate (MRR) considering the inherent material and process uncertainty. More specifically, we characterize the cutting tool dynamics using a delay differential equation (DDE) and enlist the temporal finite element method (TFEM) to derive its approximate solution and stability index given process settings or design variables. To further quantify the inherent uncertainty, replications of TFEM under different realizations of random uncontrollable variables are performed, which however incurs extra computational burden. To eschew the deployment of such a crude Monte Carlo (MC) approach at each design setting, we integrate the stochastic TFEM with a stochastic surrogate model, stochastic kriging, in an active learning framework to sequentially approximate the stability boundary. The numerical result suggests that the nominal stability boundary attained from this method is on par with that from the crude MC, but only demands a fraction of the computational overhead. To further ensure the robustness of process stability, we adopt another surrogate, the Gaussian process, to predict the variance of the stability index at unexplored design points and identify the robust stability boundary per the conditional value at risk (CVaR) criterion. Therefrom, an optimal design in the robust stable region that maximizes the MRR can be identified.
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Computationally efficient and error aware surrogate construction for numerical solutions of subsurface flow through porous media
Limiting the injection rate to restrict the pressure below a threshold at a critical location can be an important goal of simulations that model the subsurface pressure between injection and extraction wells. The pressure is approximated by the solution of Darcy’s partial differential equation for a given permeability field. The subsurface permeability is modeled as a random field since it is known only up to statistical properties. This induces uncertainty in the computed pressure. Solving the partial differential equation for an ensemble of random permeability simulations enables estimating a probability distribution for the pressure at the critical location. These simulations are computationally expensive, and practitioners often need rapid online guidance for real-time pressure management. An ensemble of numerical partial differential equation solutions is used to construct a Gaussian process regression model that can quickly predict the pressure at the critical location as a function of the extraction rate and permeability realization. The Gaussian process surrogate analyzes the ensemble of numerical pressure solutions at the critical location as noisy observations of the true pressure solution, enabling robust inference using the conditional Gaussian process distribution. Our first novel contribution is to identify a sampling methodology for the random environment and matching kernel technology for which fitting the Gaussian process regression model scales as O(nlog 𝑛) instead of the typical O(𝑛^3 ) rate in the number of samples 𝑛 used to fit the surrogate. The surrogate model allows almost instantaneous predictions for the pressure at the critical location as a function of the extraction rate and permeability realization. Our second contribution is a novel algorithm to calibrate the uncertainty in the surrogate model to the discrepancy between the true pressure solution of Darcy’s equation and the numerical solution. Although our method is derived for building a surrogate for the solution of Darcy’s equation with a random permeability field, the framework broadly applies to solutions of other partial differential equations with random coefficients.
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- Award ID(s):
- 2316011
- PAR ID:
- 10552114
- Publisher / Repository:
- Elsevier
- Date Published:
- Journal Name:
- Advances in Water Resources
- Volume:
- 193
- Issue:
- C
- ISSN:
- 0309-1708
- Page Range / eLocation ID:
- 104836
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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