Robust control of maximum photolithography overlay error in a pattern layer
- Award ID(s):
- 2342505
- PAR ID:
- 10557074
- Publisher / Repository:
- CIRP Annals
- Date Published:
- Journal Name:
- CIRP Annals
- Volume:
- 72
- Issue:
- 1
- ISSN:
- 0007-8506
- Page Range / eLocation ID:
- 429 to 432
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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