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Inclination of unpatterned, linearly polarized illumination in the plane of the electric field oscillation effected increased directional feature alignment and decreased off-axis order in Se–Te deposits generated by inorganic phototropic growth relative to that produced using normal incidence. Optically based growth simulations reproduced the experimental results indicating a photonic basis for the morphology change. Modeling of the light scattering at the growth interface revealed that illumination inclination enhances scattering that localizes the optical field along the polarization plane and suppresses cooperativity in defect-driven scattering. Thus, the symmetry of the deposited structures increased as the asymmetry of the illumination increased, as measured by the inclination of the illumination incidence away from the surface normal.
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Absolute doubly differential angular sputtering yields for 20 keV Kr+ on polycrystalline Cu
We have measured the absolute doubly differential angular sputtering yield for 20 keV Kr+ impacting a polycrystalline Cu slab at an incidence angle of θi = 45° relative to the surface normal. Sputtered Cu atoms were captured using collectors mounted on a half dome above the sample, and the sputtering distribution was measured as a function of the sputtering polar, θs, and azimuthal, ϕs, angles. Absolute results of the sputtering yield were determined from the mass gain of each collector, the ion dose, and the solid angle subtended, after irradiation to a total fluence of ∼1 × 1018 ions/cm2. Our approach overcomes shortcomings of commonly used methods that only provide relative yields as a function of θs in the incidence plane (defined by the ion velocity and the surface normal). Our experimental results display an azimuthal variation that increases with increasing θs and is clearly discrepant with simulations using binary collision theory. We attribute the observed azimuthal anisotropy to ion-induced formation of micro- and nano-scale surface features that suppress the sputtering yield through shadowing and redeposition effects, neither of which are accounted for in the simulations. Our experimental results demonstrate the importance of doubly differential angular sputtering studies to probe ion sputtering processes at a fundamental level and to explore the effect of ion-beam-generated surface roughness.
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- Award ID(s):
- 2009365
- PAR ID:
- 10570986
- Publisher / Repository:
- AIP Publishing
- Date Published:
- Journal Name:
- Journal of Applied Physics
- Volume:
- 135
- Issue:
- 3
- ISSN:
- 0021-8979
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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- Free Publicly Accessible Full Text
-
Accepted Manuscript
- Journal Article:
- https://doi.org/10.1063/5.0184417
