Chandran, Aruna, Dominique, Nathaniel L, Kaur, Gurkiran, Clark, Vincent, Nalaoh, Phattananawee, Ekowo, Lilian Chinenye, Jensen, Isabel M, Aloisio, Mark D, Crudden, Cathleen M, Arroyo-Currás, Netzahualcóyotl, Jenkins, David M, and Camden, Jon P. Forming N-heterocyclic carbene monolayers: not all deposition methods are the same. Retrieved from https://par.nsf.gov/biblio/10589838. Nanoscale 17.9 Web. doi:10.1039/D4NR04428B.

Chandran, Aruna, Dominique, Nathaniel L, Kaur, Gurkiran, Clark, Vincent, Nalaoh, Phattananawee, Ekowo, Lilian Chinenye, Jensen, Isabel M, Aloisio, Mark D, Crudden, Cathleen M, Arroyo-Currás, Netzahualcóyotl, Jenkins, David M, & Camden, Jon P. Forming N-heterocyclic carbene monolayers: not all deposition methods are the same. Nanoscale, 17 (9). Retrieved from https://par.nsf.gov/biblio/10589838. https://doi.org/10.1039/D4NR04428B

Chandran, Aruna, Dominique, Nathaniel L, Kaur, Gurkiran, Clark, Vincent, Nalaoh, Phattananawee, Ekowo, Lilian Chinenye, Jensen, Isabel M, Aloisio, Mark D, Crudden, Cathleen M, Arroyo-Currás, Netzahualcóyotl, Jenkins, David M, and Camden, Jon P. "Forming N-heterocyclic carbene monolayers: not all deposition methods are the same". Nanoscale 17 (9). Country unknown/Code not available: Royal Society of Chemistry. https://doi.org/10.1039/D4NR04428B. https://par.nsf.gov/biblio/10589838.

@article{osti_10589838,
place = {Country unknown/Code not available}, title = {Forming N-heterocyclic carbene monolayers: not all deposition methods are the same}, url = {https://par.nsf.gov/biblio/10589838}, DOI = {10.1039/D4NR04428B}, abstractNote = {}, journal = {Nanoscale}, volume = {17}, number = {9}, publisher = {Royal Society of Chemistry}, author = {Chandran, Aruna and Dominique, Nathaniel L and Kaur, Gurkiran and Clark, Vincent and Nalaoh, Phattananawee and Ekowo, Lilian Chinenye and Jensen, Isabel M and Aloisio, Mark D and Crudden, Cathleen M and Arroyo-Currás, Netzahualcóyotl and Jenkins, David M and Camden, Jon P}, }