Cho, Kyung Gook, Kim, Su Jung, Park, Dong Hyun, Kim, Min Su, Hong, Kihyon, Lee, Keun Hyung, and Frisbie, C Daniel. Band Filling, Electrochemical Reaction, and Re-Entrant Insulating Behavior in Electrolyte-Gated BBL Polymer Semiconductor Films. Retrieved from https://par.nsf.gov/biblio/10589982. ACS Applied Materials & Interfaces 17.10 Web. doi:10.1021/acsami.4c22852.

Cho, Kyung Gook, Kim, Su Jung, Park, Dong Hyun, Kim, Min Su, Hong, Kihyon, Lee, Keun Hyung, & Frisbie, C Daniel. Band Filling, Electrochemical Reaction, and Re-Entrant Insulating Behavior in Electrolyte-Gated BBL Polymer Semiconductor Films. ACS Applied Materials & Interfaces, 17 (10). Retrieved from https://par.nsf.gov/biblio/10589982. https://doi.org/10.1021/acsami.4c22852

Cho, Kyung Gook, Kim, Su Jung, Park, Dong Hyun, Kim, Min Su, Hong, Kihyon, Lee, Keun Hyung, and Frisbie, C Daniel. "Band Filling, Electrochemical Reaction, and Re-Entrant Insulating Behavior in Electrolyte-Gated BBL Polymer Semiconductor Films". ACS Applied Materials & Interfaces 17 (10). Country unknown/Code not available: ACS Appl. Mater. Interfaces. https://doi.org/10.1021/acsami.4c22852. https://par.nsf.gov/biblio/10589982.

@article{osti_10589982,
place = {Country unknown/Code not available}, title = {Band Filling, Electrochemical Reaction, and Re-Entrant Insulating Behavior in Electrolyte-Gated BBL Polymer Semiconductor Films}, url = {https://par.nsf.gov/biblio/10589982}, DOI = {10.1021/acsami.4c22852}, abstractNote = {}, journal = {ACS Applied Materials & Interfaces}, volume = {17}, number = {10}, publisher = {ACS Appl. Mater. Interfaces}, author = {Cho, Kyung Gook and Kim, Su Jung and Park, Dong Hyun and Kim, Min Su and Hong, Kihyon and Lee, Keun Hyung and Frisbie, C Daniel}, }