skip to main content
US FlagAn official website of the United States government
dot gov icon
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
https lock icon
Secure .gov websites use HTTPS
A lock ( lock ) or https:// means you've safely connected to the .gov website. Share sensitive information only on official, secure websites.


Title: Strain compensation in InGaN-based multiple quantum wells using AlGaN interlayers
Data are presented on strain compensation in InGaN-based multiple quantum wells (MQW) using AlGaN interlayers (ILs). The MQWs consist of five periods of InxGa1-xN/AlyGa1-yN/GaN emitting in the green (λ ∼ 535 nm ± 15 nm), and the AlyGa1-yN IL has an Al composition of y = 0.42. The IL is varied from 0 - 2.1 nm, and the relaxation of the MQW with respect to the GaN template layer varies with IL thickness as determined by reciprocal space mapping about the (202¯5) reflection. The minimum in the relaxation occurs at an interlayer thickness of 1 nm, and the MQW is nearly pseudomorphic to GaN. Both thinner and thicker ILs display increased relaxation. Photoluminescence data shows enhanced spectral intensity and narrower full width at half maximum for the MQW with 1 nm thick ILs, which is a product of pseudomorphic layers with lower defect density and non-radiative recombination.  more » « less
Award ID(s):
1708227
PAR ID:
10597548
Author(s) / Creator(s):
; ; ; ; ; ;
Publisher / Repository:
American Institute of Physics
Date Published:
Journal Name:
AIP Advances
Volume:
7
Issue:
10
ISSN:
2158-3226
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
More Like this
  1. Six periods of 2-nm-thick In0.15Ga0.85N/13-nm-thick GaN blue emitting multi-quantum-well (MQW) layers are grown on sapphire (Al2O3) and silicon (Si) substrates. X-ray diffraction, Raman spectroscopy, atomic force microscopy, temperature-dependent photoluminescence (PL), Micro-PL, and time-resolved PL are used to compare the structural and optical properties, and the carrier dynamics of the blue emitting active layers grown on Al2O3 and Si substrates. Indium clustering in the MQW layers is observed to be more pronounced on Al2O3 than those on Si as revealed through investigating band-filling effects of emission centers, S-shaped peak emission energy shifts with increasing temperature, and PL intensity-peak energy spatial nonuniformity correlations. The smaller indium clustering effects in MQW on Si are attributed to the residual tensile strain in the GaN buffer layer, which decreases the compressive strain and thus the piezoelectric polarization field in the InGaN quantum wells. Despite a 30% thinner total epitaxial thickness of 3.3 µm, MQW on Si exhibits a higher IQE than those on Al2O3 in terms of internal quantum efficiency (IQE) at temperatures below 250 K, and a similar IQE at 300 K (30% vs 33%). These results show that growth of blue emitting MQW layers on Si is a promising approach compared to those conventionally grown on Al2O3. 
    more » « less
  2. The structure and optical characteristics of thin (∼30 nm) wurtzite AlInN films grown pseudomorphic on free-standing, c-plane GaN substrates are presented. The Al1−xInxN layers are grown by metalorganic chemical vapor deposition, resulting in films with varying In content from x = 0.142 to 0.225. They are measured using atomic force microscopy, x-ray diffraction, reciprocal space mapping, and spectroscopic ellipsometry (SE). The pseudomorphic AlInN layers provide a set where optical properties can be determined without additional variability caused by lattice relaxation, a crucial need for designing devices. They have smooth surfaces (rms < 0.29 nm) with minimum pit areas when the In content is near lattice-matched to GaN. As expected, SE shows that the refractive index increases and the bandgap energy decreases with increased In-content. Plots of bandgap energy vs In content are fitted with a single bowing parameter of 3.19 eV when using bandgap energies for AlN and InN pseudomorphic to GaN, which is lower than previous measurements and closer to theoretical predictions. 
    more » « less
  3. In this work, we present the investigation of InN/GaN multiple-quantum-well (MQW) growth by plasma-assisted molecular beam epitaxy using in-situ reflection high-energy electron diffraction (RHEED) to monitorthe growth process. The analysis of the RHEED intensity and pattern transitions identified an indium surface ac-cumulation even with a nominal thickness of InN as small as 0.5 monolayer (ML). This result explicitly showsthat, even at low growth temperaturesof ~550 °C, not all of the supplied indium isincorporated into the quantumwell (QW). Moreover, the residual indium can become incorporated into the GaN matrix on either side of theQW. Both QW thickness and the photoluminescence (PL) emission energy showed a self-regulating behavior.The apparent thickness did not exceed 2 MLs even when the deposited InN thickness is as large as 5 MLs. ThePL emission shows a continuous redshift with the deposited InN from ~370 nm for 0.5 ML until it saturates at~423 nm forN2 ML. Based on the observed growth phenomena, a qualitative growth model was developed to ex-plain the self-limited epitaxial growth of ultrathin In(Ga)N/GaN QWs 
    more » « less
  4. Since the interface between ionic liquids (ILs) and solids always plays a critical role in important applications such as coating, lubrication, energy storage and catalysis, it is essential to unravel the molecular structure and dynamics of ILs confined to solid surfaces. Here we report direct observation of a unique double-layering quantized growth of three IL ( i.e. [Emim][FAP], [Bmim][FAP] and [Hmim][FAP]) nanofilms on mica. AFM results show that the IL nanofilms initially grow only by covering more surface areas at the constant film thickness of 2 monolayers (ML) until a quantized increase in the film thickness by another 2 ML occurs. Based on the AFM results, we propose a double-layering model describing the molecular structure of IL cations and anions on the mica surface. The interesting double-layering structure can be explained as the result of several competing interactions at the IL–mica interface. Meanwhile, the time-dependent AFM results indicate that the topography of IL nanofilms could change with time and mobility of the nanofilm is lower for ILs with longer alkyl chains, which can be attributed to the stronger solvophobic interaction. The findings here have important implications on the molecular structure and dynamics of ILs confined to solid surfaces. 
    more » « less
  5. The polarization difference and band offset between Al(Ga)N and GaN induce two-dimensional (2D) free carriers in Al(Ga)N/GaN heterojunctions without any chemical doping. A high-density 2D electron gas (2DEG), analogous to the recently discovered 2D hole gas in a metal-polar structure, is predicted in a N-polar pseudomorphic GaN/Al(Ga)N heterostructure on unstrained AlN. We report the observation of such 2DEGs in N-polar undoped pseudomorphic GaN/AlGaN heterostructures on single-crystal AlN substrates by molecular beam epitaxy. With a high electron density of ∼4.3 ×1013/cm2 that maintains down to cryogenic temperatures and a room temperature electron mobility of ∼450 cm2/V s, a sheet resistance as low as ∼320 Ω/◻ is achieved in a structure with an 8 nm GaN layer. These results indicate significant potential of AlN platform for future high-power RF electronics based on N-polar III-nitride high electron mobility transistors. 
    more » « less