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1. AlGaN-Delta-GaN Quantum Well for DUV LEDs

   https://doi.org/10.3390/photonics7040087  

   Liu, Cheng; Melanson, Bryan; Zhang, Jing (December 2020, Photonics)

   null (Ed.)

   AlGaN-delta-GaN quantum well (QW) structures have been demonstrated to be good candidates for the realization of high-efficiency deep-ultraviolet (DUV) light-emitting diodes (LEDs). However, such heterostructures are still not fully understood. This study focuses on investigation of the optical properties and efficiency of the AlGaN-delta-GaN QW structures using self-consistent six-band k⸱p modelling and finite difference time domain (FDTD) simulations. Structures with different Al contents in the AlxGa1−xN sub-QW and AlyGa1−yN barrier regions are examined in detail. Results show that the emission wavelength (λ) can be engineered through manipulation of delta-GaN layer thickness, sub-QW Al content (x), and barrier Al content (y), while maintaining a large spontaneous emission rate corresponding to around 90% radiative recombination efficiency (ηRAD). In addition, due to the dominant transverse-electric (TE)-polarized emission from the AlGaN-delta-GaN QW structure, the light extraction efficiency (ηEXT) is greatly enhanced when compared to a conventional AlGaN QW. Combined with the large ηRAD, this leads to the significant enhancement of external quantum efficiency (ηEQE), indicating that AlGaN-delta-GaN structures could be a promising solution for high-efficiency DUV LEDs. 

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2. Comparison of structural and optical properties of blue emitting In0.15Ga0.85N/GaN multi-quantum-well layers grown on sapphire and silicon substrates

   https://doi.org/10.1063/1.5078743  

   Liu, Richard; McCormick, Callan; Bayram, Can (February 2019, AIP Advances)

   Six periods of 2-nm-thick In0.15Ga0.85N/13-nm-thick GaN blue emitting multi-quantum-well (MQW) layers are grown on sapphire (Al2O3) and silicon (Si) substrates. X-ray diffraction, Raman spectroscopy, atomic force microscopy, temperature-dependent photoluminescence (PL), Micro-PL, and time-resolved PL are used to compare the structural and optical properties, and the carrier dynamics of the blue emitting active layers grown on Al2O3 and Si substrates. Indium clustering in the MQW layers is observed to be more pronounced on Al2O3 than those on Si as revealed through investigating band-filling effects of emission centers, S-shaped peak emission energy shifts with increasing temperature, and PL intensity-peak energy spatial nonuniformity correlations. The smaller indium clustering effects in MQW on Si are attributed to the residual tensile strain in the GaN buffer layer, which decreases the compressive strain and thus the piezoelectric polarization field in the InGaN quantum wells. Despite a 30% thinner total epitaxial thickness of 3.3 µm, MQW on Si exhibits a higher IQE than those on Al2O3 in terms of internal quantum efficiency (IQE) at temperatures below 250 K, and a similar IQE at 300 K (30% vs 33%). These results show that growth of blue emitting MQW layers on Si is a promising approach compared to those conventionally grown on Al2O3. 

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3. Impact of doped barriers on the recombination coefficients of c -plane InGaN/GaN single quantum well light-emitting diodes

   https://doi.org/10.1063/5.0117318  

   Chow, Y. C.; Lynsky, C.; Nakamura, S.; DenBaars, S. P.; Weisbuch, C.; Speck, J. S. (November 2022, Applied Physics Letters)

   Differential carrier lifetime measurements were performed on c-plane InGaN/GaN single quantum well (QW) light-emitting diodes (LEDs) of different QW indium compositions as well as with and without doped barriers. Mg-doped p-type and Si-doped n-type barriers close to the QW were used to reduce the net internal electric field in the QW, thereby improving the electron–hole wavefunction overlap on the LEDs. LEDs with doped barriers show short lifetimes and low carrier densities in the active region compared to the reference LEDs. The recombination coefficients in the ABC model were estimated based on the carrier lifetime and quantum efficiency measurements. The improvement in the radiative coefficients in the LEDs with doped barriers coupled with the blueshift of the emission wavelengths indeed indicates an enhancement in wavefunction overlap and a reduction of quantum confined Stark effect as a result of the reduced internal electric field. However, doped barriers also introduce non-radiative recombination centers and thereby increase the Shockley–Read–Hall (SRH) coefficient, although the increment is less for LEDs with high indium composition QWs. As a result, at high indium composition (22%), LEDs with doped barriers outperform the reference LEDs even though the trend is reversed for LEDs with lower indium composition (13.5%). Despite the trade-off of higher SRH coefficients, doped barriers are shown to be effective in reducing the internal electric field and increasing the recombination coefficients. 

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4. Optimization of InGaN quantum well interfaces for fast interwell carrier transport and low nonradiative recombination

   https://doi.org/10.1117/12.2608695  

   Yapparov, Rinat; Lynsky, Cheyenne; Chow, Yi Chao; Nakamura, Shuji; Speck, James S.; Marcinkevicius, Saulius (March 2022, SPIE OPTO)

   Morkoç, Hadis; Fujioka, Hiroshi; Schwarz, Ulrich T. (Ed.)

   Efficient high-power operation of light emitting diodes based on InGaN quantum wells (QWs) requires rapid interwell hole transport and low nonradiative recombination. The transport rate can be increased by replacing GaN barriers with that of InGaN. Introduction of InGaN barriers, however, increases the rate of the nonradiative recombination. In this work, we have attempted to reduce the negative impact of the nonradiative recombination by introducing thin GaN or AlGaN interlayers at the QW/barrier interfaces. The interlayers, indeed, reduce the nonradiative recombination rate and increase the internal quantum efficiency by about 10%. Furthermore, the interlayers do not substantially slow down the interwell hole transport; for 0.5 nm Al0.10Ga0.90N interlayers the transport rate has even been found to increase. Another positive feature of the interlayers is narrowing of the QW PL linewidth, which is attributed to smoother QW interfaces and reduced fluctuations of the QW width. 

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5. Probing Local Emission Properties in InGaN/GaN Quantum Wells by Scanning Tunneling Luminescence Microscopy

   https://doi.org/10.1002/pssb.202200365  

   Sauty, Mylène; Alyabyeva, Natalia; Lynsky, Cheyenne; Chow, Yi Chao; Nakamura, Shuji; Speck, James S.; Lassailly, Yves; Rowe, Alistair C. H.; Weisbuch, Claude; Peretti, Jacques (November 2022, physica status solidi (b))

   Scanning tunneling electroluminescence (STL) microscopy is performed on a 3 nm‐thick InGaN/GaN quantum well (QW) with [In] = 0.23 such that the main light emission occurs in the green. The technique is used to map the radiative recombination properties at a scale of a few nanometers and correlate the local electroluminescence map with the surface topography simultaneously imaged by scanning tunneling microscopy. While the expected green emission is observed all over the sample, measurements performed on a 500 nm × 500 nm area around a 150 nm‐large and 2.5 nm‐deep hexagonal defect reveal intense emission peaks at higher energies close to the defect edges, features which are not visible in the macrophotoluminescence spectrum of the sample. Via a fitting of the local tunneling electroluminescence spectra, quantitative information on the fluctuations of the intensity, peak energy, width, and phonon replica intensity of the different spectral contributions is obtained, which provides information on carrier localization in the QW. This procedure also indicates that the carrier diffusion length on the probed area of the QW is shorter than 50 nm. 

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