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Despite the dramatic progress that has been made in the power-conversion efficiency (PCE) of perovskite solar cells (PVSCs), there are still many obstacles to be overcome before these devices can be economically competitive in the photovoltaics market. One of the major hurdles in the commercialization of PVSCs is low stability, which severely limits the effective lifetime of the devices. One of the approaches to achieving higher stability and lifetime of PVSCs is improvement of PVSC film quality. In this paper, we have employed a PAMAM dendrimer layer to reduce the surface roughness of sputter-deposited indium-tin oxide (ITO) films, which were then used in the fabrication of PVSCs. A PAMAM-8 dendrimer layer was deposited by dip-coating the substrates in 25 mL of a 1 μMPAMAM-8 ethanol solution before ITOdeposition. X-ray refractivity (XRR)was used to verify the PAMAMlayer on the substrate. ITOfilms of 150 nm thicknesswere then deposited onto the PAMAMlayer using DC magnetron reactive sputtering. The surface roughness, sheet resistance, and transmissivity of the ITO films were optimized by varying the parameters of the sputtering process. Atomic force microscopy (AFM) was used to measure the surface roughness of the ITO films with and without PAMAM dendrimer layer. A root-mean-square (RMS) film roughness of 1.6 nm, sheet resistance of 21 /ϒ, and transmissivity of > 91% at a wavelength of 400–700 nm were obtained after optimization.
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Nanoimprint Lithography for Next-Generation Carbon Nanotube-Based Devices
This research reports the development of 3D carbon nanostructures that can provide unique capabilities for manufacturing carbon nanotube (CNT) electronic components, electrochemical probes, biosensors, and tissue scaffolds. The shaped CNT arrays were grown on patterned catalytic substrate by chemical vapor deposition (CVD) method. The new fabrication process for catalyst patterning based on combination of nanoimprint lithography (NIL), magnetron sputtering, and reactive etching techniques was studied. The optimal process parameters for each technique were evaluated. The catalyst was made by deposition of Fe and Co nanoparticles over an alumina support layer on a Si/SiO2 substrate. The metal particles were deposited using direct current (DC) magnetron sputtering technique, with a particle ranging from 6 nm to 12 nm and density from 70 to 1000 particles/micron. The Alumina layer was deposited by radio frequency (RF) and reactive pulsed DC sputtering, and the effect of sputtering parameters on surface roughness was studied. The pattern was developed by thermal NIL using Si master-molds with PMMA and NRX1025 polymers as thermal resists. Catalyst patterns of lines, dots, and holes ranging from 70 nm to 500 nm were produced and characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Vertically aligned CNTs were successfully grown on patterned catalyst and their quality was evaluated by SEM and micro-Raman. The results confirm that the new fabrication process has the ability to control the size and shape of CNT arrays with superior quality.
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- Award ID(s):
- 2100850
- PAR ID:
- 10610473
- Publisher / Repository:
- MDPI
- Date Published:
- Journal Name:
- Nanomaterials
- Volume:
- 14
- Issue:
- 12
- ISSN:
- 2079-4991
- Page Range / eLocation ID:
- 1011
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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- Free Publicly Accessible Full Text
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Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.3390/nano14121011
