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This content will become publicly available on September 16, 2026

Title: Optimizing Hafnium Oxide Thin-Film Dielectrics: Developing a Novel Atomic Layer Deposition Recipe
Award ID(s):
2235385
PAR ID:
10615718
Author(s) / Creator(s):
; ; ; ;
Publisher / Repository:
IEEE
Date Published:
ISBN:
979-8-3315-2946-8
Page Range / eLocation ID:
1 to 4
Format(s):
Medium: X
Location:
Bologna, Italy
Sponsoring Org:
National Science Foundation
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