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This content will become publicly available on July 24, 2026

Title: Solution Depositions of Copper and Copper Sulfide Thin Films: Effects of Thiourea
Award ID(s):
2203835
PAR ID:
10631353
Author(s) / Creator(s):
;
Publisher / Repository:
American Chemical Society
Date Published:
Journal Name:
The Journal of Physical Chemistry C
Volume:
129
Issue:
29
ISSN:
1932-7447
Page Range / eLocation ID:
13464 to 13477
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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